Resist patterning method, latent resist image forming device, resist patterning device, and resist material
US-10670967-B2 · Jun 2, 2020 · US
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Patent family 51391338
This patent family groups 4 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 51391338 |
| Family type | — |
| Earliest priority | Feb 20, 2013 |
| First filing country | US |
| Member publications | 4 |
| Countries | US |
| Representative publication | US10670967B2 — Resist patterning method, latent resist image forming device, resist patterning device, and resist material |
Representative publication
Best representative member for this family based on priority and filing country.
US10670967B2 — Resist patterning method, latent resist image forming device, resist patterning device, and resist material (published Jun 2, 2020)
Member publications
Related publications in this family.
Resist patterning method, latent resist image forming device, resist patterning device, and resist material
US-2018231892-A1 · Aug 16, 2018 · US
Resist patterning method, latent resist image forming device, resist patterning device, and resist material
US-9977332-B2 · May 22, 2018 · US
Resist patterning method, latent resist image forming device, resist patterning device, and resist material
US-2016004160-A1 · Jan 7, 2016 · US