Photosensitive resin composition and method for forming quantum dot pattern using the same
US-10108089-B2 · Oct 23, 2018 · US
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Patent family 50452968
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 50452968 |
| Family type | — |
| Earliest priority | Dec 30, 2013 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US10108089B2 — Photosensitive resin composition and method for forming quantum dot pattern using the same |
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US10108089B2 — Photosensitive resin composition and method for forming quantum dot pattern using the same (published Oct 23, 2018)
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