Process gas management for an inductively-coupled plasma deposition reactor
US-10023960-B2 · Jul 17, 2018 · US
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Patent family 50233689
This patent family groups 4 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 50233689 |
| Family type | — |
| Earliest priority | Sep 12, 2012 |
| First filing country | US |
| Member publications | 4 |
| Countries | US |
| Representative publication | US10023960B2 — Process gas management for an inductively-coupled plasma deposition reactor |
Representative publication
Best representative member for this family based on priority and filing country.
US10023960B2 — Process gas management for an inductively-coupled plasma deposition reactor (published Jul 17, 2018)
Member publications
Related publications in this family.
Process gas management for an inductively-coupled plasma deposition reactor
US-2017191164-A1 · Jul 6, 2017 · US
Process gas management for an inductively-coupled plasma deposition reactor
US-9605342-B2 · Mar 28, 2017 · US
Process gas management for an inductively-coupled plasma deposition reactor
US-2015184291-A1 · Jul 2, 2015 · US