Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method
US-9316913-B2 · Apr 19, 2016 · US
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Patent family 47715098
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 47715098 |
| Family type | — |
| Earliest priority | Aug 12, 2011 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US9316913B2 — Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method |
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US9316913B2 — Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method (published Apr 19, 2016)
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