Double patterning strategy for contact hole and trench in photolithography
US-9323155-B2 · Apr 26, 2016 · US
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Patent family 43301005
This patent family groups 1 related publication across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 43301005 |
| Family type | — |
| Earliest priority | Nov 30, 2007 |
| First filing country | US |
| Member publications | 1 |
| Countries | US |
| Representative publication | US9323155B2 — Double patterning strategy for contact hole and trench in photolithography |
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US9323155B2 — Double patterning strategy for contact hole and trench in photolithography (published Apr 26, 2016)
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