Etch rate and critical dimension uniformity by selection of focus ring material
US-2017011891-A1 · Jan 12, 2017 · US
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Patent family 41013517
This patent family groups 1 related publication across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 41013517 |
| Family type | — |
| Earliest priority | Feb 29, 2008 |
| First filing country | US |
| Member publications | 1 |
| Countries | US |
| Representative publication | US2017011891A1 — Etch rate and critical dimension uniformity by selection of focus ring material |
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US2017011891A1 — Etch rate and critical dimension uniformity by selection of focus ring material (published Jan 12, 2017)
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