Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same
US-10077365-B2 · Sep 18, 2018 · US
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Cleaning of porous materials
Cleaning of porous materials · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H10P70/58 |
| Official title | {Cleaning of porous materials} |
| Display label | Cleaning of porous materials |
| Total patents | 7 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity appears stable based on the most recent years.
| Year | Patents |
|---|---|
| 2015 | 3 |
| 2016 | 2 |
| 2017 | 1 |
| 2018 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Semiconductor device, method for manufacturing the same, and rinsing liquid
US-9780008-B2 · Oct 3, 2017 · US
Liquid Chemical for Forming Water Repellent Protecting Film, and Process for Cleaning Wafers Using the Same
US-2016230016-A1 · Aug 11, 2016 · US
Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same
US-9349582-B2 · May 24, 2016 · US
Semiconductor device, method for manufacturing the same, and rinsing liquid
US-2015187670-A1 · Jul 2, 2015 · US
Method of stripping organic mask with reduced damage to low-K film
US-9040430-B2 · May 26, 2015 · US
Method of stripping organic mask with reduced damage to low-k film
US-2015004797-A1 · Jan 1, 2015 · US