Method for forming silicon-containing film and film forming apparatus
US-2024087883-A1 · Mar 14, 2024 · US
Silicides
Silicides · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/42 |
| Official title | Silicides |
| Display label | Silicides |
| Total patents | 450 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 24 |
| 2016 | 31 |
| 2017 | 30 |
| 2018 | 29 |
| 2019 | 34 |
| 2020 | 51 |
| 2021 | 38 |
| 2022 | 46 |
| 2023 | 35 |
| 2024 | 55 |
| 2025 | 59 |
| 2026 | 18 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Halogen-Containing Silane-Based Metal Silicide As Nucleation Layer For Tungsten ALD
US-2017350013-A1 · Dec 7, 2017 · US
Coating structure, heat exchanger, and method for manufacturing heat exchanger
US-2017327943-A1 · Nov 16, 2017 · US
Component of a molybdenum alloy and method for forming an oxidation protection layer therefor
US-2017241271-A1 · Aug 24, 2017 · US
Heteroleptic Diazadiene-Containing Tungsten Precursors for Thin Film Deposition
US-2017022609-A1 · Jan 26, 2017 · US
Organometallic Complex, Light-Emitting Element, Light-Emitting Device, Electronic Device, and Lighting Device
US-2016343960-A1 · Nov 24, 2016 · US
Method for forming manganese-containing film
US-2016326646-A1 · Nov 10, 2016 · US
Laminate film, organic electroluminescent device, photoelectric conversion device, and liquid crystal display
US-2016319432-A1 · Nov 3, 2016 · US
PECVD microcrystalline silicon germanium (SiGe)
US-9484199-B2 · Nov 1, 2016 · US
Chemical vapor deposition process for depositing a silica coating on a glass substrate
US-2016305021-A1 · Oct 20, 2016 · US
Niobium-containing film forming compositions and vapor deposition of niobium-containing films
US-2016307904-A1 · Oct 20, 2016 · US
Tantalum-containing film forming compositions and vapor deposition of tantalum-containing films
US-2016307708-A1 · Oct 20, 2016 · US
Ultrathin atomic layer deposition film accuracy thickness control
US-2016276148-A1 · Sep 22, 2016 · US
Organic-inorganic hybrid thin film and method for producing the same
US-2016276241-A1 · Sep 22, 2016 · US
Silicon carbide semiconductor device manufacturing method and silicon carbide semiconductor device
US-9418840-B2 · Aug 16, 2016 · US
Method For Producing Nickel Thin Film on a Si Substrate By Chemical Vapor Deposition Method, And Method For Producing Ni Silicide Thin Film On Si Substrate
US-2016233098-A1 · Aug 11, 2016 · US
Precursors for silicon dioxide gap fill
US-2016225615-A1 · Aug 4, 2016 · US
Metal Silicide Formation Through An Intermediate Metal Halogen Compound
US-2016222505-A1 · Aug 4, 2016 · US
Chemical vapor deposition process for depositing a silica coating on a glass substrate
US-9404179-B2 · Aug 2, 2016 · US
Substrate structure and method for preparing the same
US-2016215394-A1 · Jul 28, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/42?
- CPC C23C16/42 is the Cooperative Patent Classification code for “Silicides.”
- How many patents are filed under CPC C23C16/42 (Silicides)?
- Our database includes 450 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/42 growing?
- Publication counts under this code: 55 in 2024 vs 59 in 2025 (latest complete years).