Mxene with excellent mechanical strength and fast and high-yield anhydrous synthesis method thereof
US-2023136591-A1 · May 4, 2023 · US
containing halogen {(C11D3/162, C11D3/164, C11D3/166, C11D3/168 take precedence)}
containing halogen {(C11D3/162, C11D3/164, C11D3/166, C11D3/168 take precedence)} · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C11D3/24 |
| Official title | containing halogen {(C11D3/162, C11D3/164, C11D3/166, C11D3/168 take precedence)} |
| Display label | containing halogen {(C11D3/162, C11D3/164, C11D3/166, C11D3/168 take precedence)} |
| Total patents | 90 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 7 |
| 2016 | 6 |
| 2017 | 4 |
| 2018 | 7 |
| 2019 | 6 |
| 2020 | 8 |
| 2021 | 12 |
| 2022 | 9 |
| 2023 | 9 |
| 2024 | 14 |
| 2025 | 8 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlorite Ions
US-2022325205-A1 · Oct 13, 2022 · US
Removal of contaminants from euv masks
US-2022283495-A1 · Sep 8, 2022 · US
Viscoelastic, solid surfactant composition
US-11396641-B2 · Jul 26, 2022 · US
Treatment liquid for semiconductor wafers, which contains hypochlorite ions
US-11390829-B2 · Jul 19, 2022 · US
Anti-microbial liquid detergent composition
US-2022195350-A1 · Jun 23, 2022 · US
Removal of electroluminescenct materials for substrates
US-2022056376-A1 · Feb 24, 2022 · US
Mechanism of urea/solid acid interaction under storage conditions and storage stable solid compositions comprising urea and acid
US-2022053757-A1 · Feb 24, 2022 · US
Moderately alkaline cleaning compositions for proteinaceous and fatty soil removal at low temperatures
US-11236291-B2 · Feb 1, 2022 · US
Detergent composition, cleaning method, solvent composition, use thereof as solvent for oil, and oil composition containing same
US-11220658-B2 · Jan 11, 2022 · US
Detergent composition, cleaning method, solvent composition, use thereof as solvent for oil, and oil composition containing same
US-2021403837-A1 · Dec 30, 2021 · US
Jasmol
US-2021403830-A1 · Dec 30, 2021 · US
Mechanism of urea/solid acid interaction under storage conditions and storage stable solid compositions comprising urea and acid
US-11191264-B2 · Dec 7, 2021 · US
Azeotropic compositions comprising dimethyl carbonate and perfluoroalkene ethers
US-2021340468-A1 · Nov 4, 2021 · US
Post CMP cleaning composition
US-11124746-B2 · Sep 21, 2021 · US
Cleansing compositions comprising a mixture of phenol disinfectants
US-11028349-B2 · Jun 8, 2021 · US
Aerosol cleaning composition
US-2021139820-A1 · May 13, 2021 · US
Photoactivating device for washing machine
US-2021087738-A1 · Mar 25, 2021 · US
Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlorite Ions
US-2021062115-A1 · Mar 4, 2021 · US
Nitrogen and/or oxygen-containing hydrofluoroolefins and methods of making and using the same
US-10934247-B2 · Mar 2, 2021 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C11D3/24?
- CPC C11D3/24 is the Cooperative Patent Classification code for “containing halogen {(C11D3/162, C11D3/164, C11D3/166, C11D3/168 take precedence)}.”
- How many patents are filed under CPC C11D3/24 (containing halogen {(C11D3/162, C11D3/164, C11D3/166, C11D3/168 take precedence)})?
- Our database includes 90 publications tagged with this CPC code.
- Is patent activity under CPC C11D3/24 growing?
- Publication counts under this code: 14 in 2024 vs 8 in 2025 (latest complete years).