Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product
US-12084628-B2 · Sep 10, 2024 · US
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Surface-active compounds containing fluorine and phosphorus
Surface-active compounds containing fluorine and phosphorus · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C11D1/006 |
| Official title | {Surface-active compounds containing fluorine and phosphorus} |
| Display label | Surface-active compounds containing fluorine and phosphorus |
| Total patents | 17 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 2 |
| 2016 | 4 |
| 2017 | 1 |
| 2018 | 3 |
| 2019 | 1 |
| 2020 | 2 |
| 2022 | 1 |
| 2023 | 1 |
| 2024 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Hard surface cleaners including fluorosurfactants
US-11884897-B2 · Jan 30, 2024 · US
Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product
US-2023167381-A1 · Jun 1, 2023 · US
Fluorinated tensides
US-11535589-B2 · Dec 27, 2022 · US
Particle removal from electrochromic films using non-aqueous fluids
US-2020362274-A1 · Nov 19, 2020 · US
Particle removal from electrochromic films using non-aqueous fluids
US-10767143-B2 · Sep 8, 2020 · US
Fluorinated tensides
US-2019276397-A1 · Sep 12, 2019 · US
Water-repellent protective film, and chemical solution for forming protective film
US-10090148-B2 · Oct 2, 2018 · US
Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same
US-10077365-B2 · Sep 18, 2018 · US
Hard surface cleaners including fluorosurfactants
US-2018148667-A1 · May 31, 2018 · US
Liquid composition for removing titanium nitride, semiconductor-element cleaning method using same, and semiconductor-element manufacturing method
US-9777251-B2 · Oct 3, 2017 · US
Liquid composition for removing titanium nitride, semiconductor-element cleaning method using same, and semiconductor-element manufacturing method
US-2016281038-A1 · Sep 29, 2016 · US
Liquid Chemical for Forming Water Repellent Protecting Film, and Process for Cleaning Wafers Using the Same
US-2016230016-A1 · Aug 11, 2016 · US
Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same
US-9349582-B2 · May 24, 2016 · US
Fluorophosphate surfactants
US-9328317-B2 · May 3, 2016 · US
Particle Removal From Electrochromic Films Using Non-Aqueous Fluids
US-2015253642-A1 · Sep 10, 2015 · US
Water-Repellent Protective Film, and Chemical Solution for Forming Protective Film
US-2015179433-A1 · Jun 25, 2015 · US