Polymer composition which can be cured at room temperature and which is made of polyaldehyde and 1,3 keto ester
US-2026028442-A1 · Jan 29, 2026 · US
containing nitrogen
containing nitrogen · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08G16/0231 |
| Official title | {containing nitrogen} |
| Display label | containing nitrogen |
| Total patents | 39 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 1 |
| 2016 | 4 |
| 2017 | 2 |
| 2018 | 4 |
| 2019 | 9 |
| 2020 | 5 |
| 2021 | 6 |
| 2022 | 2 |
| 2023 | 1 |
| 2024 | 1 |
| 2025 | 3 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Polymer having aldehyde groups
US-2025353948-A1 · Nov 20, 2025 · US
Polymer composition which can be cured at room temperature and which is made of polyaldehyde and polycyanoacetate
US-2025346705-A1 · Nov 13, 2025 · US
Poly(cyanocinnamate)s for structural and optical applications
US-12360455-B2 · Jul 15, 2025 · US
Thermoset materials obtained from specific phthalonitrile resins for high-temperature applications
US-2024124651-A1 · Apr 18, 2024 · US
Novel formo-phenolic resins, process for the preparation thereof, and use of same in the extraction of uranium from water
US-2023398517-A1 · Dec 14, 2023 · US
Polymer, organic layer composition and method of forming patterns
US-11512162-B2 · Nov 29, 2022 · US
Bisphenol M diphthalonitrile ether resin, bisphenol P diphthalonitrile ether resin, methods of making same, resin blends, and two component systems
US-11401364-B2 · Aug 2, 2022 · US
Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer
US-11181821-B2 · Nov 23, 2021 · US
Polyhemiaminal and polyhexahydrotriazine materials from 1,4 conjugate addition reactions
US-11041048-B2 · Jun 22, 2021 · US
Hard-mask forming composition and method for manufacturing electronic component
US-2021132498-A1 · May 6, 2021 · US
Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
US-10998197-B2 · May 4, 2021 · US
Silica-based organogels via hexahydrotriazine-based reactions
US-10975217-B2 · Apr 13, 2021 · US
Bisphenol M diphthalonitrile ether resin blends including a filler, and articles
US-10899865-B2 · Jan 26, 2021 · US
Bisphenol m diphthalonitrile ether resin blends including a filler, and articles
US-2020299506-A1 · Sep 24, 2020 · US
Poly(cyanocinnamate)s for structural and optical applications
US-2020257202-A1 · Aug 13, 2020 · US
Cyanic acid ester compound, method for producing same, resin composition, cured product, prepreg, material for encapsulation, fiber-reinforced composite material, adhesive, metal foil-clad laminate, resin sheet, and printed circuit board
US-2020255575-A1 · Aug 13, 2020 · US
Resin blends of resorcinol diphthalonitrile ether with bisphenol M diphthalonitrile ether and/or bisphenol T diphthalonitrile ether
US-10640598-B2 · May 5, 2020 · US
Polymer, organic layer composition and method of forming patterns
US-2020024384-A1 · Jan 23, 2020 · US
Polyhemiaminal and polyhexahydrotriazine materials from 1,4 conjugate addition reactions
US-2019177481-A1 · Jun 13, 2019 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C08G16/0231?
- CPC C08G16/0231 is the Cooperative Patent Classification code for “containing nitrogen.”
- How many patents are filed under CPC C08G16/0231 (containing nitrogen)?
- Our database includes 39 publications tagged with this CPC code.
- Is patent activity under CPC C08G16/0231 growing?
- Publication counts under this code: 1 in 2024 vs 3 in 2025 (latest complete years).