Resist compound, method for forming pattern using same, and method for manufacturing semiconductor device using same
US-12560865-B2 · Feb 24, 2026 · US
containing one ring
containing one ring · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F212/04 |
| Official title | containing one ring |
| Display label | containing one ring |
| Total patents | 54 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 4 |
| 2016 | 4 |
| 2017 | 4 |
| 2018 | 7 |
| 2019 | 8 |
| 2020 | 5 |
| 2021 | 4 |
| 2022 | 6 |
| 2023 | 2 |
| 2024 | 4 |
| 2025 | 4 |
| 2026 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Onium salt monomer, polymer, chemically amplified negative resist composition, and resist pattern forming process
US-2026010074-A1 · Jan 8, 2026 · US
Polymer, chemically amplified negative resist composition, and resist pattern forming process
US-2025270357-A1 · Aug 28, 2025 · US
Acid-functionalized copolymers of methyl methacrylate and acrylic resin compositions based thereon
US-12312429-B2 · May 27, 2025 · US
Resist composition and method for forming resist pattern
US-2025110404-A1 · Apr 3, 2025 · US
Polycyclic aromatic hydrocarbon photocurable resin composition
US-2025011507-A1 · Jan 9, 2025 · US
Proton exchange membrane
US-2024266571-A1 · Aug 8, 2024 · US
Proton exchange membrane
US-2024222672-A1 · Jul 4, 2024 · US
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device
US-2024192598-A1 · Jun 13, 2024 · US
Photo-alignment thermosetting liquid crystal composition, alignment film-cum-retardation film and production method therefor, retardation plate and production method therefor, optical member and production method therefor, and display device
US-2024117250-A1 · Apr 11, 2024 · US
Polymeric resin for dielectric applications
US-11603422-B2 · Mar 14, 2023 · US
Block copolymers and uses thereof
US-11555085-B2 · Jan 17, 2023 · US
Resist compound, method for forming pattern using same, and method for manufacturing semiconductor device using same
US-2022404700-A1 · Dec 22, 2022 · US
Resin composition and preparation method therefor
US-2022372183-A1 · Nov 24, 2022 · US
Curable petroleum resin, preparation method thereof, and use thereof
US-11499068-B2 · Nov 15, 2022 · US
Positive resist composition, resist film formation method, and laminate manufacturing method
US-11402753-B2 · Aug 2, 2022 · US
Multi-copolymer, methods for producing the same and using thereof in wastewater treatment
US-11365272-B2 · Jun 21, 2022 · US
Polymer and positive resist composition
US-2022187708-A1 · Jun 16, 2022 · US
Block copolymer
US-11155666-B2 · Oct 26, 2021 · US
Block copolymer
US-11078318-B2 · Aug 3, 2021 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C08F212/04?
- CPC C08F212/04 is the Cooperative Patent Classification code for “containing one ring.”
- How many patents are filed under CPC C08F212/04 (containing one ring)?
- Our database includes 54 publications tagged with this CPC code.
- Is patent activity under CPC C08F212/04 growing?
- Publication counts under this code: 4 in 2024 vs 4 in 2025 (latest complete years).