Block copolymer

Patent metadata

Field	Value
Publication number	US-11155666-B2
Application number	US-201716346333-A
Country	US
Kind code	B2
Filing date	Nov 29, 2017
Priority date	Nov 30, 2016
Publication date	Oct 26, 2021
Grant date	Oct 26, 2021

Abstract

The present application may provide a block copolymer and a use thereof. The block copolymer of the present application has excellent self-assembly properties or phase separation characteristics, to which various functions to be required can also be freely imparted.

First claim

The invention claimed is:

1. A block copolymer comprising a polymer segment A having a unit represented by Formula 1 below and a polymer segment B having a unit represented by Formula 9 below:

in Formula 1, R 1 is hydrogen or an alkyl group having 1 to 4 carbon atoms, Q 1 is a single bond, —O-L 1 -C(═O)— or —O-L 1 -, X 1 is —N(R 2 )-L 2 -C(═O)—O—, O—C(═O)—, —C(═O)—O—, a urethane linker or a urea linker, where L 1 is an alkylene group having 1 to 4 carbon atoms, L 2 is an alkylene group having 1 to 4 carbon atoms or an alkylidene group having 2 to 4 carbon atoms and R 2 is hydrogen or an alkyl group having 1 to 4 carbon atoms, and Y 1 is a linear hydrocarbon chain having 8 to 20 chain-forming atoms, wherein at least one carbon atom is optionally replaced with an oxygen, nitrogen or sulfur, and at least one hydrogen atom is optionally substituted with a substituent that is not a halogen atom;

in Formula 9, X 2 is a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 — or —X 1 —C(═O)—, where X 1 is a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group, R 1 to R 5 are each independently hydrogen, an alkyl group, a haloalkyl group or a halogen atom, and the number of the halogen atoms contained in R 1 to R 5 is 1 or more.

2. The block copolymer according to claim 1 , wherein the block copolymer is in a diblock form containing only the polymer segments A and B as the polymer segments.

3. The block copolymer according to claim 2 , wherein the polymer segment B is connected to one end of the polymer segment A.

4. The block copolymer according to claim 1 , wherein in Formula 1, R 1 is hydrogen or an alkyl group having 1 to 4 carbon atoms, Q 1 is a single bond or —O-L 1 -C(═O)—, and X 1 is —N(R 2 )-L 2 -C(═O)—O—, where L 1 is a linear alkylene group having 1 to 4 carbon atoms, L 2 is a methylene group or an ethylidene group and R 2 is hydrogen.

5. The block copolymer according to claim 1 , wherein in Formula 1, R 1 is hydrogen or an alkyl group having 1 to 4 carbon atoms, Q 1 is —O-L 1 -, and X 1 is —O—C(═O)—, —C(═O)—O—, a urethane linker or a urea linker, where L 1 is a linear alkylene group having 1 to 4 carbon atoms.

6. The block copolymer according to claim 1 , wherein each of the chain-forming atoms is independently carbon, oxygen, nitrogen or sulfur.

7. The block copolymer according to claim 1 , wherein each of the chain-forming atoms is independently carbon or oxygen.

8. The block copolymer according to claim 1 , wherein in Formula 9, X 2 is a single bond, an oxygen atom, a sulfur atom or —S(═O) 2 — and R 1 to R 5 are each a halogen atom.

9. The block copolymer according to claim 1 , wherein in Formula 9, the halogen atom is a fluorine atom.

10. The block copolymer according to claim 1 , wherein the sum of volume fraction of the polymer segment A and volume fraction of the polymer segment B is 1, and the volume fraction of the polymer segment A is in a range of 0.10 to 0.90.

11. The block copolymer according to claim 1 , wherein in Formula 9, X 2 is a single bond, an oxygen atom, an alkylene group, —C(═O)—O— or —O—C(═O)—.

12. The block copolymer according to claim 1 , wherein in Formula 9, the number of halogen atoms contained in R 1 to R 5 is 5 or more.

13. The block copolymer according to claim 1 , wherein the block copolymer has a number average molecular weight (Mn) in a range of 3,000 to 300,000.

14. The block copolymer according to claim 1 , wherein the block copolymer has a polydispersity (Mw/Mn) in a range of 1.01 to 1.60.

15. A method for forming a polymer film, comprising forming on a substrate a polymer film comprising a self-assembled structure of the block copolymer of claim 1 .

16. A patterning method comprising a process of selectively removing any one of polymer segments of a self-assembled structure of the block copolymer of claim 1 from a laminate having a substrate and a polymer film which is formed on the substrate and comprises the block copolymer.

Assignees

• Lg Chemical Ltd

Inventors

• Park No Jin
• Kim Jung Keun
• Lee Je Gwon
• Yoon Sung Soo
• Ku Se Jin
• Lee Mi Sook
• Choi Eun Young
• Ryu Hyung Ju

Classifications

• H10P76/00

  Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

• H10P50/28

  of insulating materials · CPC title

• C08F220/283

  and containing one or more carboxylic moiety in the chain, e.g. acetoacetoxyethyl(meth)acrylate · CPC title

• C08F2438/01

  Atom Transfer Radical Polymerization [ATRP] or reverse ATRP · CPC title

• C08F220/38

  Esters containing sulfur · CPC title