Naphthyl acrylates as writing monomers for photopolymers
US-2017363957-A1 · Dec 21, 2017 · US
Esters containing sulfur
Esters containing sulfur · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F20/38 |
| Official title | Esters containing sulfur |
| Display label | Esters containing sulfur |
| Total patents | 256 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 17 |
| 2016 | 17 |
| 2017 | 32 |
| 2018 | 30 |
| 2019 | 33 |
| 2020 | 30 |
| 2021 | 20 |
| 2022 | 22 |
| 2023 | 11 |
| 2024 | 22 |
| 2025 | 16 |
| 2026 | 6 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Polymerizable compound and optically anisotropic body
US-2017362508-A1 · Dec 21, 2017 · US
Biocompatible coatings and hydrogels for reducing foreign body response and fibrosis
US-2017355799-A1 · Dec 14, 2017 · US
Polymers including a methylene beta-ketoester and products formed therefrom
US-2017355789-A1 · Dec 14, 2017 · US
Composition for forming upper layer film, pattern forming method using the same, and method for manufacturing electronic device
US-2017351179-A1 · Dec 7, 2017 · US
Water dispersion of gel particles, producing method thereof, and image forming method
US-2017342171-A1 · Nov 30, 2017 · US
Monomer, polymer, positive resist composition, and patterning process
US-9829792-B2 · Nov 28, 2017 · US
Monomer, polymer, resist composition, and patterning process
US-2017299963-A1 · Oct 19, 2017 · US
Polymer, monomer, resist composition, and patterning process
US-9790166-B2 · Oct 17, 2017 · US
Conductive polymer composite and substrate
US-9752045-B2 · Sep 5, 2017 · US
Monomer, polymer, resist composition, and patterning process
US-2017226252-A1 · Aug 10, 2017 · US
Resist composition and pattern forming process
US-9720324-B2 · Aug 1, 2017 · US
Monomer, polymer, resist composition, and patterning process
US-2017131635-A1 · May 11, 2017 · US
Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device
US-2017115568-A1 · Apr 27, 2017 · US
Conductive polymer composition, coated article, and patterning process
US-2017090286-A1 · Mar 30, 2017 · US
Conductive polymer composite comprising a sulfo group-containing dopant polymer
US-9601229-B2 · Mar 21, 2017 · US
Polymer compound for a conductive polymer and method for producing same
US-2017058059-A1 · Mar 2, 2017 · US
Conductive polymer composite and substrate
US-2017062089-A1 · Mar 2, 2017 · US
Conductive polymer composite and substrate
US-2017058144-A1 · Mar 2, 2017 · US
Multifunctional monomers, methods for making multifunctional monomers, polymerizable compositions and products formed thereform
US-2017050914-A1 · Feb 23, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C08F20/38?
- CPC C08F20/38 is the Cooperative Patent Classification code for “Esters containing sulfur.”
- How many patents are filed under CPC C08F20/38 (Esters containing sulfur)?
- Our database includes 256 publications tagged with this CPC code.
- Is patent activity under CPC C08F20/38 growing?
- Publication counts under this code: 22 in 2024 vs 16 in 2025 (latest complete years).