Sulfonium salt monomer, sulfonium salt quencher, polymer, chemically amplified resist composition, and patterning method
US-2026050217-A1 · Feb 19, 2026 · US
Halogens
Halogens · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F12/16 |
| Official title | Halogens |
| Display label | Halogens |
| Total patents | 32 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 1 |
| 2017 | 2 |
| 2018 | 2 |
| 2019 | 3 |
| 2020 | 3 |
| 2021 | 3 |
| 2022 | 3 |
| 2023 | 3 |
| 2024 | 1 |
| 2025 | 5 |
| 2026 | 6 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Sulfonium salt type monomer, sulfonium salt type quencher, polymer, chemically amplified resist composition, and pattern forming method
US-2026049169-A1 · Feb 19, 2026 · US
Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process
US-2026042875-A1 · Feb 12, 2026 · US
Salt, acid generator, resin, resist composition and method for producing resist pattern
US-2026029709-A1 · Jan 29, 2026 · US
Paste for secondary battery, slurry for secondary battery positive electrode, positive electrode for secondary battery, secondary battery, and method of producing paste for secondary battery
US-12531246-B2 · Jan 20, 2026 · US
Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process
US-2026001978-A1 · Jan 1, 2026 · US
Polarizing plate and optical display comprising the same
US-12498511-B2 · Dec 16, 2025 · US
Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process
US-2025298314-A1 · Sep 25, 2025 · US
Photosensitive composition, cured film, color filter, light shielding film, optical element, solid-state imaging element, infrared sensor, and headlight unit
US-12422746-B2 · Sep 23, 2025 · US
Radiation-sensitive composition, method for forming resist pattern, polymer, and compound
US-2025258431-A1 · Aug 14, 2025 · US
Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process
US-2025244665-A1 · Jul 31, 2025 · US
Radiopaque polymers
US-12098220-B2 · Sep 24, 2024 · US
Compound, polymer, composition, composition for film formation, pattern formation method, insulating film formation method, and method for producing compound
US-2023348351-A1 · Nov 2, 2023 · US
Neutral layer composition
US-11732072-B2 · Aug 22, 2023 · US
Photosensitive composition, cured film, color filter, light shielding film, optical element, solid-state imaging element, infrared sensor, and headlight unit
US-2023025715-A1 · Jan 26, 2023 · US
Paste for secondary battery, slurry for secondary battery positive electrode, positive electrode for secondary battery, secondary battery, and method of producing paste for secondary battery
US-2022407076-A1 · Dec 22, 2022 · US
Compound, polymer, composition, composition for film formation, pattern formation method, insulating film formation method, and method for producing compound, as well as method for producing iodine-containing vinyl polymer and acetylated derivative thereof
US-2022348698-A1 · Nov 3, 2022 · US
Polarizing plate and optical display comprising the same
US-2022075108-A1 · Mar 10, 2022 · US
Neutral layer composition
US-11193036-B2 · Dec 7, 2021 · US
Radiopaque polymers
US-2021221928-A1 · Jul 22, 2021 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C08F12/16?
- CPC C08F12/16 is the Cooperative Patent Classification code for “Halogens.”
- How many patents are filed under CPC C08F12/16 (Halogens)?
- Our database includes 32 publications tagged with this CPC code.
- Is patent activity under CPC C08F12/16 growing?
- Publication counts under this code: 1 in 2024 vs 5 in 2025 (latest complete years).