Method for producing organic compound
US-12559468-B2 · Feb 24, 2026 · US
Radicals substituted by halogen atoms or nitro radicals
Radicals substituted by halogen atoms or nitro radicals · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07D317/16 |
| Official title | Radicals substituted by halogen atoms or nitro radicals |
| Display label | Radicals substituted by halogen atoms or nitro radicals |
| Total patents | 29 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 3 |
| 2016 | 4 |
| 2017 | 2 |
| 2018 | 4 |
| 2020 | 2 |
| 2021 | 3 |
| 2023 | 2 |
| 2024 | 5 |
| 2025 | 2 |
| 2026 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method for producing fluororesin
US-12522679-B2 · Jan 13, 2026 · US
Method for producing fluorine-containing dioxolane, and composition useful for producing same
US-2025382275-A1 · Dec 18, 2025 · US
Radiation-sensitive composition, method for forming pattern, and radiation-sensitive acid generator
US-2025362596-A1 · Nov 27, 2025 · US
Composition containing fluorine-containing monomer, method for stabilizing fluorine-containing monomer, method for manufacturing fluorine-containing polymer, and method for manufacturing fluorine-containing monomer
US-2024391893-A1 · Nov 28, 2024 · US
Novel compound, and photoelectric device, image sensor, and electronic device including same
US-2024237529-A1 · Jul 11, 2024 · US
Electrolyte and battery cell, battery, and electrical device containing same
US-2024234818-A1 · Jul 11, 2024 · US
Fluororesin
US-2024158551-A1 · May 16, 2024 · US
Composition
US-2024030491-A1 · Jan 25, 2024 · US
Fluororesin and method for producing same
US-2023118752-A1 · Apr 20, 2023 · US
Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid
US-11592746-B2 · Feb 28, 2023 · US
Method for producing organic compound
US-2021371391-A1 · Dec 2, 2021 · US
Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid
US-2021263413-A9 · Aug 26, 2021 · US
Method for preparing a polyfluorinated compound
US-2021163408-A1 · Jun 3, 2021 · US
Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid
US-2020341376-A1 · Oct 29, 2020 · US
Salt and photoresist composition containing the same
US-10670963-B2 · Jun 2, 2020 · US
Salt and photoresist composition containing the same
US-2018259851-A1 · Sep 13, 2018 · US
Piperidine derivative, liquid crystal composition and liquid crystal display device
US-10053425-B2 · Aug 21, 2018 · US
Method for producing 2-amino-substituted benzaldehyde compound
US-10047037-B2 · Aug 14, 2018 · US
Process for preparing chloroacetaldehyde acetals
US-9896428-B2 · Feb 20, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07D317/16?
- CPC C07D317/16 is the Cooperative Patent Classification code for “Radicals substituted by halogen atoms or nitro radicals.”
- How many patents are filed under CPC C07D317/16 (Radicals substituted by halogen atoms or nitro radicals)?
- Our database includes 29 publications tagged with this CPC code.
- Is patent activity under CPC C07D317/16 growing?
- Publication counts under this code: 5 in 2024 vs 2 in 2025 (latest complete years).