Radiation-sensitive composition, pattern formation method, and photo-degradable base
US-2025013150-A1 · Jan 9, 2025 · US
Process for preparing chloroacetaldehyde acetals
US9896428B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9896428-B2 |
| Application number | US-201615066090-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 10, 2016 |
| Priority date | Mar 18, 2015 |
| Publication date | Feb 20, 2018 |
| Grant date | Feb 20, 2018 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
The invention relates to a process for preparing chloroacetaldehyde acetals of monohydric, dihydric or higher-functionality aliphatic alcohols, in which the chloroacetaldehyde acetal is obtained from an aqueous chloroacetaldehyde solution in the presence of the alcohol to be acetalized and an acid catalyst by azeotropic removal of water with the aid of a solvent, wherein the solvent is a halogenated solvent.
First claim
Opening claim text (preview).
What is claimed is: 1. A process for preparing a chloroacetaldehyde acetal of an aliphatic alcohol, wherein the chloroacetaldehyde acetal is obtained from an aqueous chloroacetaldehyde solution containing 30-50% by weight chloroacetaldehyde in a presence of the aliphatic alcohol to be acetalized and an acid catalyst by azeotropic removal of water with the aid of a solvent, wherein the solvent is trichloromethane. 2. The process as claimed in claim 1 , wherein the aliphatic alcohol to be acetalized is a monohydric, dihydric or higher-functionality aliphatic alcohol having from one to twelve carbon atoms. 3. The process as claimed in claim 1 , wherein the acid catalyst is a member selected from the group consisting of an inorganic acid, an organic acid and a strong acid ion exchange resin containing sulfonic acid groups. 4. The process as claimed in claim 1 , wherein the acid catalyst is present in an amount of from 0.01 mol % to 2 mol % based on the chloroacetaldehyde used. 5. The process as claimed in claim 2 , wherein the acid catalyst is a member selected from the group consisting of an inorganic acid, an organic acid and a strong acid ion exchange resin containing sulfonic acid groups. 6. The process as claimed in claim 5 , wherein the acid catalyst is present in an amount of from 0.01 mol % to 2 mol % based on the chloroacetaldehyde used.
Assignees
Inventors
Classifications
by dehydration of compounds containing hydroxy groups · CPC title
not condensed with other rings · CPC title
- C07D321/06Primary
1,3-Dioxepines; Hydrogenated 1,3-dioxepines · CPC title
by condensation of aldehydes, paraformaldehyde, or ketones · CPC title
containing halogen · CPC title
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9896428B2 cover?
- The invention relates to a process for preparing chloroacetaldehyde acetals of monohydric, dihydric or higher-functionality aliphatic alcohols, in which the chloroacetaldehyde acetal is obtained from an aqueous chloroacetaldehyde solution in the presence of the alcohol to be acetalized and an acid catalyst by azeotropic removal of water with the aid of a solvent, wherein the solvent is a haloge…
- Who is the assignee on this patent?
- Wacker Chemie Ag
- What technology area does this patent fall under?
- Primary CPC classification C07D321/06. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 20 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).