Sulfonium salt monomer, sulfonium salt quencher, polymer, chemically amplified resist composition, and patterning method
US-2026050217-A1 · Feb 19, 2026 · US
containing halogen
containing halogen · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C59/135 |
| Official title | containing halogen |
| Display label | containing halogen |
| Total patents | 42 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 6 |
| 2016 | 4 |
| 2017 | 9 |
| 2018 | 1 |
| 2019 | 3 |
| 2020 | 4 |
| 2021 | 5 |
| 2022 | 2 |
| 2023 | 2 |
| 2025 | 3 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Sulfonium salt type monomer, sulfonium salt type quencher, polymer, chemically amplified resist composition, and pattern forming method
US-2026049169-A1 · Feb 19, 2026 · US
Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process
US-2026001978-A1 · Jan 1, 2026 · US
Method for producing fluoroalkoxide
US-12338213-B2 · Jun 24, 2025 · US
A liquid-liquid extraction method for separating carboxylate monofunctional perfluoropolyethers and carboxylate difunctional perfluoropolyethers
US-2025179246-A1 · Jun 5, 2025 · US
Onium salt, chemically amplified resist composition and patterning process
US-12240804-B2 · Mar 4, 2025 · US
Salt compound, resist composition and patterning process
US-2023205083-A1 · Jun 29, 2023 · US
Aldehyde adduct of hexafluoropropylene oxide, method of manufacturing trifluoropyruvyl fluoride dimer and method of manufacturing perfluoro(2,4-dimethyl-2-fluoroformyl-1,3-dioxolane)
US-11555024-B2 · Jan 17, 2023 · US
Radiation-sensitive resin composition and method for forming resist pattern
US-2022177424-A1 · Jun 9, 2022 · US
Onium salt, chemically amplified resist composition and patterning process
US-2022127225-A1 · Apr 28, 2022 · US
Resist composition and patterning process
US-11181823-B2 · Nov 23, 2021 · US
Covalently-bound polybromocyclododecane flame retardants
US-11072744-B2 · Jul 27, 2021 · US
Aldehyde adduct of hexafluoropropylene oxide, method of manufacturing trifluoropyruvyl fluoride dimer and method of manufacturing perfluoro(2,4-dimethyl-2-fluoroformyl-1,3-dioxolane)
US-2021214332-A1 · Jul 15, 2021 · US
Onium salt compound, chemically amplified resist composition and patterning process
US-2021188770-A1 · Jun 24, 2021 · US
Fluorinated oligomers having pendant functional groups
US-10975025-B2 · Apr 13, 2021 · US
Method for removing perfluorinated alkanoic acids
US-10744497-B2 · Aug 18, 2020 · US
Methods for converting fluorinated compounds
US-10737998-B2 · Aug 11, 2020 · US
Covalently-bound polybromocyclododecane flame retardants
US-2020115633-A1 · Apr 16, 2020 · US
Resist composition and patterning process
US-2020089112-A1 · Mar 19, 2020 · US
Fluorinated tensides
US-10464874-B2 · Nov 5, 2019 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07C59/135?
- CPC C07C59/135 is the Cooperative Patent Classification code for “containing halogen.”
- How many patents are filed under CPC C07C59/135 (containing halogen)?
- Our database includes 42 publications tagged with this CPC code.
- Is patent activity under CPC C07C59/135 growing?
- Publication counts under this code: 2 in 2023 vs 3 in 2025 (latest complete years).