Negative resist composition and resist pattern forming process
US-10120279-B2 · Nov 6, 2018 · US
of a saturated carbon skeleton containing rings
of a saturated carbon skeleton containing rings · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C309/19 |
| Official title | of a saturated carbon skeleton containing rings |
| Display label | of a saturated carbon skeleton containing rings |
| Total patents | 148 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 18 |
| 2016 | 16 |
| 2017 | 9 |
| 2018 | 23 |
| 2019 | 12 |
| 2020 | 14 |
| 2021 | 12 |
| 2022 | 11 |
| 2023 | 11 |
| 2024 | 10 |
| 2025 | 11 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Resist composition and patterning process
US-10101654-B2 · Oct 16, 2018 · US
(s)-csa salt of s-ketamine, (r)-csa salt of s-ketamine and processes for the preparation of s-ketamine
US-2018282266-A1 · Oct 4, 2018 · US
Photoacid-generating compound and associated polymer, photoresist composition, and method of forming a photoresist relief image
US-10088749-B2 · Oct 2, 2018 · US
Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent
US-2018267406-A1 · Sep 20, 2018 · US
Salt and photoresist composition containing the same
US-2018259851-A1 · Sep 13, 2018 · US
Mixed dimers from alpha-olefin sulfonic acids
US-2018223173-A1 · Aug 9, 2018 · US
Photoacid-generating compound and associated polymer, photoresist composition, and method of forming a photoresist relief image
US-2018095363-A1 · Apr 5, 2018 · US
Adhesive composition, bio-electrode, method for manufacturing a bio-electrode, and salt
US-2018086948-A1 · Mar 29, 2018 · US
Process for preparing 7H-pyrrolo[2,3-D]pyrimidine compounds
US-9926327-B2 · Mar 27, 2018 · US
Resist composition and patterning process
US-2018081267-A1 · Mar 22, 2018 · US
Salt and photoresist composition containing the same
US-2018065925-A1 · Mar 8, 2018 · US
Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device
US-9904167-B2 · Feb 27, 2018 · US
Resist composition and patterning process
US-2018039173-A1 · Feb 8, 2018 · US
Negative resist composition and resist pattern forming process
US-2018039175-A1 · Feb 8, 2018 · US
Sulfonic acid derivative, photoacid generator using same, resist composition, and device manufacturing method
US-2018011401-A1 · Jan 11, 2018 · US
Salts and polymorphs of 8-fluoro-2-{4-[(methylamino)methyl]phenyl}-1,3,4,5-tetrahydro-6H-azepino[5,4,3-cd]indol-6-one
US-9861638-B2 · Jan 9, 2018 · US
Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound
US-9766541-B2 · Sep 19, 2017 · US
Salt, acid generator, resist composition and method for producing resist pattern
US-9760005-B2 · Sep 12, 2017 · US
Process for preparing 7h-pyrrolo[2,3-d]pyrimidine compounds
US-2017233397-A1 · Aug 17, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07C309/19?
- CPC C07C309/19 is the Cooperative Patent Classification code for “of a saturated carbon skeleton containing rings.”
- How many patents are filed under CPC C07C309/19 (of a saturated carbon skeleton containing rings)?
- Our database includes 148 publications tagged with this CPC code.
- Is patent activity under CPC C07C309/19 growing?
- Publication counts under this code: 10 in 2024 vs 11 in 2025 (latest complete years).