Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, method for forming pattern, and method for producing electronic device
US-12535734-B2 · Jan 27, 2026 · US
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containing etherified hydroxy groups bound to the carbon skeleton
containing etherified hydroxy groups bound to the carbon skeleton · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C309/09 |
| Official title | containing etherified hydroxy groups bound to the carbon skeleton |
| Display label | containing etherified hydroxy groups bound to the carbon skeleton |
| Total patents | 11 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 1 |
| 2017 | 2 |
| 2018 | 2 |
| 2019 | 1 |
| 2021 | 2 |
| 2023 | 1 |
| 2025 | 1 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
US-12216404-B2 · Feb 4, 2025 · US
Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, method for forming pattern, and method for producing electronic device
US-2023075188-A1 · Mar 9, 2023 · US
Resist composition, patterning process, and barium salt
US-11163232-B2 · Nov 2, 2021 · US
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
US-2021088905-A1 · Mar 25, 2021 · US
Resist composition, patterning process, and barium salt
US-2019113846-A1 · Apr 18, 2019 · US
Resist composition and patterning process
US-10101654-B2 · Oct 16, 2018 · US
Resist composition and patterning process
US-2018081267-A1 · Mar 22, 2018 · US
Sulfonate-based compound and method for preparing same
US-9776958-B2 · Oct 3, 2017 · US
Sulfonate-based compound and method for preparing same
US-2017210707-A1 · Jul 27, 2017 · US
Resist composition, method of forming resist pattern, polymeric compound, and compound
US-9023581-B2 · May 5, 2015 · US