Azophenols as ERG oncogene inhibitors
US-11648239-B2 · May 16, 2023 · US
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Compounds containing chains of at least two nitrogen atoms with at least one nitrogen-to-nitrogen multiple bond (azoxy compounds C07C291/08)
Compounds containing chains of at least two nitrogen atoms with at least one nitrogen-to-nitrogen multiple bond (azoxy compounds C07C291/08) · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C245/00 |
| Official title | Compounds containing chains of at least two nitrogen atoms with at least one nitrogen-to-nitrogen multiple bond (azoxy compounds C07C291/08) |
| Display label | Compounds containing chains of at least two nitrogen atoms with at least one nitrogen-to-nitrogen multiple bond (azoxy compounds C07C291/08) |
| Total patents | 8 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 1 |
| 2016 | 1 |
| 2017 | 1 |
| 2018 | 1 |
| 2019 | 2 |
| 2021 | 1 |
| 2023 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Azophenols as erg oncogene inhibitors
US-2021299106-A1 · Sep 30, 2021 · US
Azophenols as ERG Oncogene Inhibitors
US-2019336485-A1 · Nov 7, 2019 · US
Azophenols as ERG oncogene inhibitors
US-10238639-B2 · Mar 26, 2019 · US
Azophenols as ERG Oncogene Inhibitors
US-2018169074-A1 · Jun 21, 2018 · US
Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer
US-9546133-B2 · Jan 17, 2017 · US
Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer
US-2016023992-A1 · Jan 28, 2016 · US
Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer
US-9216948-B2 · Dec 22, 2015 · US