Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine
US-10407594-B2 · Sep 10, 2019 · US
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Noller Bastian Marten patents
Noller Bastian Marten holds 3 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 3 |
| Recent patents | 0 |
| First publication | Sep 13, 2016 |
| Latest publication | Sep 10, 2019 |
Filing trend
Year-over-year patent counts for this assignee.
Recent patents
Latest publications where this party is an assignee.
Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films
US-9524874-B2 · Dec 20, 2016 · US
Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si1-xGex material in the presence of a CMP composition comprising a specific organic compound
US-9443739-B2 · Sep 13, 2016 · US
Notable patents
Representative or frequently cited publications from precomputed assignee stats.
Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine
US-10407594-B2 · Sep 10, 2019 · US
Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films
US-9524874-B2 · Dec 20, 2016 · US
Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si1-xGex material in the presence of a CMP composition comprising a specific organic compound
US-9443739-B2 · Sep 13, 2016 · US
Technology areas
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Chemistry & Metallurgy | 3 |
| Electricity | 3 |