Composition for forming resist overlayer film for EUV lithography
US-11675269-B2 · Jun 13, 2023 · US
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Sakamoto Rikimaru — Physics
Sakamoto Rikimaru holds 5 patents in Physics, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Sakamoto Rikimaru |
| Technology | Physics |
| Patents in slice | 5 |
| Recent patents in slice | 1 |
| First year | 2015 |
| Last year | 2023 |
Representative patents
Notable publications linking Sakamoto Rikimaru to Physics.
Composition for forming resist overlayer film for EUV lithography
US-11675269-B2 · Jun 13, 2023 · US
Composition for forming resist overlayer film for EUV lithography
US-11675269-B2 · Jun 13, 2023 · US
Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound
US-11372330-B2 · Jun 28, 2022 · US
Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound
US-11372330-B2 · Jun 28, 2022 · US
Recent filings
Latest patents from Sakamoto Rikimaru in Physics.
Composition for forming resist overlayer film for EUV lithography
US-11675269-B2 · Jun 13, 2023 · US
Composition for forming resist overlayer film for EUV lithography
US-11675269-B2 · Jun 13, 2023 · US
Composition for forming resist overlayer film for EUV lithography
US-11675269-B2 · Jun 13, 2023 · US
Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound
US-11372330-B2 · Jun 28, 2022 · US
Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound
US-11372330-B2 · Jun 28, 2022 · US
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