Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
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Yamakawa Masako — Physics
Yamakawa Masako holds 2 patents in Physics, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Yamakawa Masako |
| Technology | Physics |
| Patents in slice | 2 |
| Recent patents in slice | 0 |
| First year | 2015 |
| Last year | 2017 |
Representative patents
Notable publications linking Yamakawa Masako to Physics.
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
Recent filings
Latest patents from Yamakawa Masako in Physics.
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
US-9598392-B2 · Mar 21, 2017 · US
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