Air gap spacer formation for nano-scale semiconductor devices
US-2024079266-A1 · Mar 7, 2024 · US
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Tessera Llc patents
Tessera Llc holds 2 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 2 |
| Recent patents | 1 |
| First publication | Jul 5, 2022 |
| Latest publication | Mar 7, 2024 |
Filing trend
Year-over-year patent counts for this assignee.
Recent patents
Latest publications where this party is an assignee.
Selective removal of semiconductor fins
US-11380589-B2 · Jul 5, 2022 · US
Notable patents
Representative or frequently cited publications from precomputed assignee stats.
Air gap spacer formation for nano-scale semiconductor devices
US-2024079266-A1 · Mar 7, 2024 · US
Selective removal of semiconductor fins
US-11380589-B2 · Jul 5, 2022 · US
Top CPC classifications
Most common classification codes in this portfolio.
| CPC | Patents |
|---|---|
| H10D30/62 | 2 |
| H10D30/024 | 2 |
| H01L29/66795 | 2 |
| H01L29/785 | 2 |
| H10P32/30 | 1 |
Technology areas
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Electricity | 2 |