Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hong Seung-Hee was listed as an assignee on 2 patent publications in 2017.
| Metric | Value |
|---|---|
| Company | Hong Seung-Hee |
| Year | 2017 |
| Patents | 2 |
Representative publications for Hong Seung-Hee in 2017.
US-9665003-B2 · May 30, 2017 · US
US-9574108-B2 · Feb 21, 2017 · US
Most common classification codes for Hong Seung-Hee in 2017.
| CPC | Patents |
|---|---|
| C01B33/023 | 1 |
| C08G2261/314 | 1 |
| C08G61/02 | 1 |
| C08L83/00 | 1 |
| C08L83/02 | 1 |
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