Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method
US-11939665-B2 · Mar 26, 2024 · US
This page is not indexed by search engines while we improve data quality.
Tokyo Electron Limted patents
Tokyo Electron Limted holds 3 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 3 |
| Recent patents | 1 |
| First publication | Aug 21, 2018 |
| Latest publication | Mar 26, 2024 |
Filing trend
Year-over-year patent counts for this assignee.
Recent patents
Latest publications where this party is an assignee.
Substrate processing apparatus
US-11674225-B2 · Jun 13, 2023 · US
Plasma processing apparatus and temperature control method
US-10056223-B2 · Aug 21, 2018 · US
Notable patents
Representative or frequently cited publications from precomputed assignee stats.
Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method
US-11939665-B2 · Mar 26, 2024 · US
Substrate processing apparatus
US-11674225-B2 · Jun 13, 2023 · US
Plasma processing apparatus and temperature control method
US-10056223-B2 · Aug 21, 2018 · US
Technology areas
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Chemistry & Metallurgy | 3 |
| Electricity | 3 |
| Operations & Transport | 2 |
| Physics | 1 |
| Cross-Sectional Technologies | 1 |