Multi charged particle beam writing apparatus
US-2024242922-A1 · Jul 18, 2024 · US
Lithography system and projection method
USRE45552E · US · E1
| Field | Value |
|---|---|
| Publication number | US-RE45552-E |
| Application number | US-201213689665-A |
| Country | US |
| Kind code | E1 |
| Filing date | Nov 29, 2012 |
| Priority date | Mar 10, 2006 |
| Publication date | Jun 9, 2015 |
| Grant date | Jun 9, 2015 |
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Abstract
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The present invention relates a probe forming lithography system for generating a pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched “on” or “off, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.
First claim
Opening claim text (preview).
The invention claimed is: 1. Method of operating a writing beam probe forming lithography system for projecting a pattern on to a target surface, comprising: using an “on” and “off” writing strategy to operate said writing beam probe based on dividing said pattern over a grid comprising grid cells, wherein said pattern includes features having a size larger than that of each one of said grid cells, in each of said grid cells, switching said writing beam probe “on” or “off”, wher…
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Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
- H01J37/3177Primary
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent USRE45552E cover?
- The present invention relates a probe forming lithography system for generating a pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switch…
- Who is the assignee on this patent?
- Mapper Lithography Ip Bv
- What technology area does this patent fall under?
- Primary CPC classification H01J37/3177. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Jun 09 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (E1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).