Method for etching a primary preform

Patent metadata

Field	Value
Publication number	US-9994480-B2
Application number	US-201615293715-A
Country	US
Kind code	B2
Filing date	Oct 14, 2016
Priority date	Oct 16, 2015
Publication date	Jun 12, 2018
Grant date	Jun 12, 2018

Abstract

The present invention relates in a first aspect to a method for etching a primary preform or core rod. The present invention moreover relates in a second aspect to the etched primary preform thus obtained and moreover to a final preform and optical fibers obtained therefrom and to a method of preparing optical fibers therefrom.

First claim

The invention claimed is:

1. A method for etching a primary preform, the method comprising the steps of:
introducing the primary preform having an outer diameter OD PP into the central cavity of a hollow etching tube having an outer diameter OD ET and an inner diameter ID ET such that a part of the outer surface of the primary preform contacts a part of the inner surface of the etching tube, thereby forming an open region between a remaining part of the outer surface of the primary preform and a remaining part of the inner surface of the etching tube;
mounting the etching tube with the primary preform inserted in its central cavity on a lathe and introducing the etching tube into a central aperture of an applicator mounted on the lathe, wherein the applicator and the etching tube are moved in axial direction with respect to each other;
rotating the etching tube around its axis thereby causing a counter rotation of the primary preform within the etching tube; and
coupling electromagnetic radiation into the applicator and creating within a part of the etching tube that is surrounded by the applicator a plasma that moves in translation back and forth over the length of the etching tube during one or more passes, wherein during at least a part of at least one pass the outside of the primary preform is etched by supplying a fluorine-containing etching gas to the open region in order to obtain an etched primary preform.

2. The method according to claim 1 , wherein the difference between the outer diameter of the primary preform OD PP and the inner diameter of the etching tube ID ET (ID ET −OD PP ) is at least 4 millimeters.

3. The method according to claim 1 , comprising at least ten passes.

4. The method according to claim 1 , wherein the fluorine-containing etching gas is supplied during at least one complete pass.

5. The method according to claim 1 , wherein the fluorine-containing etching gas comprises CCl 2 F 2 , CF 4 , C 2 F 6 , C 4 F 8 , SF 6 , NF 3 , SO 2 F 2 , CHF 3 , CClF 3 , and/or CCl 3 F.

6. The method according to claim 1 , wherein the fluorine-containing etching gas is C 2 F 6 .

7. The method according to claim 1 , wherein the fluorine-containing etching gas comprises a fluorine-containing gas mixed with one or more carrier gases.

8. The method according to claim 1 , wherein the fluorine-containing etching gas comprises argon and/or oxygen.

9. The method according to claim 1 , wherein the applicator and the etching tube are moved in axial direction with respect to each other with a translation speed of between 1 and 40 meters/second.

10. The method according to a claim 1 , wherein the rotation of the etching tube is a continuous rotation or a stepwise rotation.

11. The method according to claim 1 , wherein the rotation speed of the etching tube is between 0.1 and 2 rotations per pass.

12. The method according to claim 1 , wherein the power of the electromagnetic radiation is between 3 kW and 10 kW.

13. The method according to claim 1 , wherein the length of the etching tube L ET is greater than the length of the primary preform L PP (L ET >L PP ).

14. The method according to claim 1 , wherein the etching tube is a silica tube.

15. The method according to claim 1 , comprising increasing the diameter of the etched primary preform through the application of an external layer of silica to form a final preform.

16. The method according to claim 1 , comprising drawing the final preform into an optical fiber.

17. A method for etching a primary preform, comprising:
providing a primary preform having an outer diameter OD PP positioned within the central cavity of an etching tube having an inner diameter ID ET , wherein (i) the etching tube's inner diameter ID ET is greater than the primary preform's outer diameter OD PP and (ii) part of the primary preform's outer surface is in contact with part of the etching tube's inner surface thereby forming an open etching region between a remaining part of the primary preform's outer surface and a remaining part of the etching tube's inner surface;
rotating the etching tube around its axis to counter rotate the primary preform within the etching tube;
translating a plasma back and forth over the etching tube's length in one or more plasma passes; and
during at least a part of at least one plasma pass, supplying a fluorine-containing etching gas to the open etching region to etch the outside of the primary preform.

18. The method according to claim 17 , coupling electromagnetic radiation into an applicator that surrounds the etching tube to create the plasma, wherein the applicator and the etching tube are moved in axial direction with respect to each other to thereby translate the plasma back and forth over the etching tube's length.

19. The method according to claim 17 , wherein the step of rotating the etching tube around its axis comprises continuously rotating the etching tube around its axis to continuously counter rotate the primary preform within the etching tube.

20. The method according to claim 17 , wherein the step of rotating the etching tube around its axis comprises stepwise rotating the etching tube around its axis to stepwise counter rotate the primary preform within the etching tube.

Assignees

• Draka Comteq Bv
• Draka Comteq Bv

Inventors

• Milicevic Igor
• Van Stralen Mattheus Jacobus Nicolaas
• Krabshuis Gertjan
• Hartsuiker Johannes Antoon

Classifications

• C03C15/02 Primary

  for making a smooth surface · CPC title

• C03B37/018

  by glass deposition on a glass substrate, e.g. by {inside-, modified-, plasma- or plasma modified-} chemical vapour deposition {[ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod} (C03B37/016 takes precedence; surface treatment of glass by coating with glass C03C17/02) · CPC title

• C03B37/01228 Primary

  Removal of preform material (C03B37/01251 takes precedence) · CPC title

• C03B37/01861

  Means for changing or stabilising the diameter or form of tubes or rods · CPC title

• C03C17/23

  Oxides (C03C17/02 takes precedence) · CPC title