Semiconductor device and liquid crystal display device

US9989828B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9989828-B2
Application numberUS-201515504963-A
CountryUS
Kind codeB2
Filing dateAug 17, 2015
Priority dateAug 20, 2014
Publication dateJun 5, 2018
Grant dateJun 5, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A semiconductor device includes: a first substrate; a gate electrode on the first substrate; a gate insulating layer on the gate electrode; an oxide semiconductor film including a channel region disposed over the gate electrode through the gate insulating layer and lowered-resistance region contacting the channel region; a source electrode and a drain electrode on the channel region; a first insulating film covering at least the channel region and including a contact hole that exposes the lowered-resistance region; and a second insulating film having reducing characteristics and disposed above the first insulating film across the contact hole, the second insulating film contacting the lowered-resistance region inside the contact hole.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor device, comprising: a first substrate; a gate electrode on the first substrate; a gate insulating layer on the gate electrode; an oxide semiconductor film including a channel region disposed over the gate electrode through the gate insulating layer, and a lowered-resistance region contacting the channel region; a source electrode and a drain electrode on the channel region; a first insulating film covering at least the channel region and including a contact hole that exposes the lowered-resistance region; and a second insulating film having reducing characteristics and disposed above the first insulating film across the contact hole, said second insulating film contacting the lowered-resistance region inside the contact hole, wherein the second insulating film contains hydrogen and wherein a distance between an edge of the contact hole and the source electrode is greater than 1.5 μm. 2. The semiconductor device according to claim 1 , wherein the second insulating film surrounds, in a plan view, the first insulating film that covers the channel region. 3. The semiconductor device according to claim 1 , wherein the oxide semiconductor film contains indium (In), gallium (Ga), zinc (Zn), and oxygen (O). 4. The semiconductor device according to claim 3 , wherein the oxide semiconductor film is a crystalline oxide semiconductor film. 5. A liquid crystal display device, comprising: the semiconductor device according to claim 1 ; a second substrate facing the first substrate of the semiconductor device; and a liquid crystal layer containing liquid crystal molecules and interposed between the first substrate and second substrate, wherein the semiconductor device includes a third conductive film disposed in a location above the second insulating film overlapping at least the lowered-resistance region in a plan view, wherein one of the lowered-resistance region and the third conductive film has a plurality of slit openings having slit-like shapes, said one of the lowered-resistance region and the third conductive film forming a pixel electrode in each pixel, and wherein another of the lowered-resistance region and the third conductive film forms a common electrode that generates an electric field between the common electrode and the pixel electrode to control orientation of the liquid crystal molecules. 6. The semiconductor device according to claim 1 , wherein the drain electrode is formed on a region in the oxide semiconductor film to which the lowered-resistance region extends. 7. The semiconductor device according to claim 1 , wherein a distance between an edge of the contact hole and the drain electrode is smaller than 1.5 μm.

Assignees

Inventors

Classifications

  • Arrangements for improving the aperture ratio · CPC title

  • pixel · CPC title

  • Physics · mapped topic

  • G02F1/1368Primary

    in which the switching element is a three-electrode device {(G02F1/136277 takes precedence)} · CPC title

  • common or background · CPC title

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Frequently asked questions

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What does patent US9989828B2 cover?
A semiconductor device includes: a first substrate; a gate electrode on the first substrate; a gate insulating layer on the gate electrode; an oxide semiconductor film including a channel region disposed over the gate electrode through the gate insulating layer and lowered-resistance region contacting the channel region; a source electrode and a drain electrode on the channel region; a first in…
Who is the assignee on this patent?
Sharp Kk
What technology area does this patent fall under?
Primary CPC classification G02F1/1368. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jun 05 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).