Directed energy deposition with cooling mechanism

US9988718B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9988718-B2
Application numberUS-201615184598-A
CountryUS
Kind codeB2
Filing dateJun 16, 2016
Priority dateJun 19, 2015
Publication dateJun 5, 2018
Grant dateJun 5, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A material deposition system and method for cooling a component after material deposition. The method of deposition and cooling comprising a platform, a deposition head, and a cooling mechanism. The platform adapted to support a component for the addition of material. The deposition head including a material depositor configured to deposit material on a surface of a component supported on the platform an and an energy source configured to energize material deposited onto a surface of a component supported on the platform to bond the material to the component. The cooling system including bristles.

First claim

Opening claim text (preview).

What is claimed is: 1. A material deposition system, the system comprising a platform adapted to support a component for the addition of material, a deposition head including a material depositor configured to deposit material on a surface of a component supported on the platform and an energy source configured to energize material deposited onto a surface of a component supported on the platform to bond the material to the component, and a cooling mechanism including a gas source configured to discharge cooling medium toward a component supported on the platform and a plurality of thermally conductive bristles arranged to interact with cooling medium discharged from the gas source toward a component supported on the platform when the gas source discharges cooling medium, wherein the conductive bristles forms a passageway sized to allow the cooling medium to flow through each of the conductive bristles towards the component. 2. The system of claim 1 , wherein the conductive bristles comprise a conductive material with a conductivity between about 1 W/(m K) and about 450W/(m K) at 25° C. 3. The system of claim 1 , wherein the conductive bristles are arranged to contact the component, to increase heat transfer over cooling medium alone. 4. The system of claim 1 , wherein the conductive bristles are located between the deposition head and the platform. 5. The system of claim 1 , wherein the conductive bristles are coupled to the deposition head for movement with the deposition head. 6. The system of claim 5 , wherein the deposition head and the conductive bristles are mounted for movement relative to the platform. 7. The system of claim 1 , wherein the platform is mounted for movement relative to the deposition head. 8. The system of claim 7 , wherein the platform is mounted for movement relative to the plurality of conductive bristles. 9. The system of claim 1 , wherein the cooling mechanism further comprises purging nozzles configured to discharge a shield gas to inhibit material addition onto the conductive bristles. 10. The system of claim 9 , wherein the purging nozzles are located between some of the plurality of the conductive bristles and the deposition head. 11. A material deposition system, the system comprising a platform adapted to support a component for the addition of material, a deposition head including a material depositor configured to deposit material on a surface of a component supported on the platform and an energy source configured to energize material deposited onto a surface of a component supported on the platform to bond the material to the component, and a cooling mechanism including a gas source configured to discharge cooling medium toward a component supported on the platform and a plurality of bristles arranged to interact with cooling medium discharged from the gas source toward a component supported on the platform when the gas source discharges cooling medium, wherein the cooling mechanism further comprises a shield arranged to inhibit material addition onto the conductive bristles. 12. The system of claim 11 , wherein the shield is between the conductive bristles and the deposition head. 13. A material deposition system, the system comprising a platform, a deposition head including a material depositor and an energy source, and a cooling mechanism including a gas source configured to discharge cooling air toward a component supported on the platform and a plurality of bristles arranged to direct the cooling air from the gas source along the bristles toward the component. 14. The system of claim 13 , wherein the cooling mechanism further comprises purging nozzles configured to discharge a shield gas to inhibit material addition onto the bristles. 15. The system of claim 13 , wherein the bristles are conductive bristles and comprise a thermally conductive material with a conductivity between about 1 W/(m K) and about 450 W/(m K) at 25° C.

Assignees

Inventors

Classifications

  • Processes of additive manufacturing · CPC title

  • Operations & Transport · mapped topic

  • the fluid stream containing particles, e.g. powder · CPC title

  • C23C16/463Primary

    Cooling of the substrate · CPC title

  • Repairing methods or devices · CPC title

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Frequently asked questions

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What does patent US9988718B2 cover?
A material deposition system and method for cooling a component after material deposition. The method of deposition and cooling comprising a platform, a deposition head, and a cooling mechanism. The platform adapted to support a component for the addition of material. The deposition head including a material depositor configured to deposit material on a surface of a component supported on the p…
Who is the assignee on this patent?
Rolls Royce Corp
What technology area does this patent fall under?
Primary CPC classification C23C16/463. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 05 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).