Coating film-equipped glass substrate, and method for producing coating film-equipped glass substrate

Patent metadata

Field	Value
Publication number	US-9988303-B2
Application number	US-201615298646-A
Country	US
Kind code	B2
Filing date	Oct 20, 2016
Priority date	Apr 24, 2014
Publication date	Jun 5, 2018
Grant date	Jun 5, 2018

Abstract

A glass substrate provided with a coating film, including a glass substrate and a coating film containing at least one TiO 2 layer having a refractive index of at least 2.20 at a wavelength of 632 nm, formed by low temperature plasma CVD method on the glass substrate, and a method for producing a glass substrate provided with a coating film, which includes forming a TiO 2 layer on a glass substrate by low temperature plasma CVD method using a film-forming material containing at least one member selected from an alkoxide type titanium material, an amide type titanium material and a halide type titanium material, at a plasma power density of at least 55 kW/m at a film-forming rate of from 15 to 200 nm·m/min.

First claim

What is claimed is:

1. A glass substrate provided with a coating film, comprising:
a glass substrate; and
a coating film comprising at least one TiO 2 -containing layer,
wherein the at least one TiO 2 -containing layer has a TiO 2 content of from 90 mass % to 99 mass %, has a refractive index of at least 2.20 at a wavelength of 632 nm, comprises at least one member selected from the group consisting of an alkoxide type titanium material, an amide type titanium material, and a halide type titanium material, and is formed by a low temperature plasma CVD method.

2. The glass substrate provided with a coating film according to claim 1 , wherein the at least one TiO 2 -containing layer has a thickness of from 10 to 1,000 nm.

3. The glass substrate provided with a coating film according to claim 1 , wherein the coating film has at least one layer having a refractive index of at most 1.60 at a wavelength of 632 nm and alternately laminated with the at least one TiO 2 -containing layer.

4. The glass substrate provided with a coating film according to claim 1 , wherein the at least one TiO 2 -containing layer comprises at least one member selected from the group consisting of an alkoxide type titanium material and an amide type titanium material.

5. The glass substrate provided with a coating film according to claim 1 , wherein the at least one TiO 2 -containing layer comprises titanium tetraisopropoxide.

6. The glass substrate provided with a coating film according to claim 1 , wherein the at least one TiO 2 -containing layer has the TiO 2 content of from 95 mass % to 99 mass %.

7. A method for producing the glass substrate provided with a coating film according to claim 1 , comprising:
forming a TiO 2 -containing layer on a glass substrate by a low temperature plasma CVD method using a film-forming material containing at least one member selected from the group consisting of an alkoxide type titanium material, an amide type titanium material and a halide type titanium material, at a plasma power density of at least 55 kW/m at a film-forming rate of from 15 to 200 nm·m/min.

8. The method according to claim 7 , wherein the TiO 2 -containing layer has a refractive index of at least 2.20 at a wavelength of 632 nm.

9. The method according to claim 7 , further comprising, after the forming of the TiO 2 -containing layer, subjecting the glass substrate provided with the TiO 2 -containing layer to heat treatment.

10. The method according to claim 9 , wherein the heat treatment is carried out at a temperature of from 600 to 700° C.

11. The method according to claim 7 , wherein the film-forming material contains at least one member selected from the group consisting of an alkoxide type titanium material and an amide type titanium material.

12. The method according to claim 11 , wherein the film-forming material contains titanium tetraisopropoxide.

13. A glass substrate provided with a coating film, comprising:
a glass substrate; and
a coating film comprising at least one TiO 2 -containing layer,
wherein the at least one TiO 2 -containing layer has a TiO 2 content of from 90 mass % to 99 mass %, has a refractive index of at least 2.20 at a wavelength of 632 nm, comprises at least one member selected from the group consisting of an alkoxide type titanium material, an amide type titanium material, and a halide type titanium material,
is subjected to heat treatment at a temperature of at least 600° C. and at most 650° C., and has a haze of at most 0.5%.

14. A glass substrate provided with a coating film, comprising:
a glass substrate; and
a coating film comprising at least one TiO 2 -containing layer,
wherein the at least one TiO 2 -containing layer has a TiO 2 content of from 90 mass % to 99 mass %, has a refractive index of at least 2.20 at a wavelength of 632 nm, comprises at least one member selected from the group consisting of an alkoxide type titanium material, an amide type titanium material, and a halide type titanium material,
is subjected to heat treatment at a temperature of higher than 650° C. and at most 700° C., and has a haze of at most 1%.

Assignees

• Asahi Glass Co Ltd

Inventors

• Hanekawa Hiroshi
• Aomine Nobutaka
• Kawahara Hirotomo
• Aoshima Yuki
• Maeshige Kazunobu

Classifications

• C23C16/405 Primary

  of refractory metals or yttrium · CPC title

• C03C2218/153

  by plasma-enhanced cvd · CPC title

• C03C2217/73

  Anti-reflective coatings with specific characteristics · CPC title

• G02B1/11

  Anti-reflection coatings · CPC title

• C03C17/001

  General methods for coating; Devices therefor · CPC title