Plasma light source and inspection apparatus including the same

Patent metadata

Field	Value
Publication number	US-9983144-B2
Application number	US-201514964065-A
Country	US
Kind code	B2
Filing date	Dec 9, 2015
Priority date	Dec 11, 2014
Publication date	May 29, 2018
Grant date	May 29, 2018

Abstract

Provided are a plasma light source capable of solving a problem occurring when an arc discharge lamp is used and an inspection apparatus capable of providing uniform and high-brightness plasma light. The plasma light source includes a pulse laser generator configured to generate a pulse laser beam, a continuous wave (CW) laser generator configured to generate an infrared ray (IR) CW laser beam, a first dichroic mirror configured to transmit or reflect the pulse laser beam and reflect or transmit the IR CW laser beam, a chamber configured to receive the pulse laser beam to ignite plasma and the IR CW laser beam to maintain the plasma in an ignited state, and discharge plasma light generated by the plasma, and a second dichroic mirror configured to transmit the pulse laser beam and the IR CW laser beam and reflect the plasma light.

First claim

What is claimed is:

1. A plasma light source comprising:
a pulse laser generator configured to generate a pulse laser beam;
a continuous wave (CW) laser generator configured to generate an infrared ray (IR) CW laser beam;
a first dichroic mirror configured to selectively transmit or reflect the pulse laser beam and to selectively reflect or transmit the IR CW laser beam;
a chamber configured to receive the pulse laser beam to ignite plasma and the IR CW laser beam to maintain the plasma in an ignited state, and to discharge plasma light generated by the plasma; and
a second dichroic mirror configured to transmit the pulse laser beam and the IR CW laser beam and reflect the plasma light, wherein the pulse laser beam is a ring-shaped beam and is input to the first dichroic mirror.

2. The plasma light source of claim 1 , wherein the chamber has no electrodes therein.

3. The plasma light source of claim 1 , wherein the chamber is surrounded by an elliptical mirror and is disposed at a focus of the elliptical mirror, and
the pulse laser beam and the IR CW laser beam are concentrated on the chamber by the elliptical mirror.

4. The plasma light source of claim 1 , wherein the first dichroic mirror and the second dichroic mirror are disposed on a same axis to selectively reflect or transmit light according to a wavelength, so that input light beams incident on the chamber are synthesized and an output light beam from the chamber is separated from the input light beams.

5. The plasma light source of claim 1 , wherein the pulse laser beam is input to the chamber by reflection of the first dichroic mirror and transmission of the second dichroic mirror, and
the IR CW laser beam passes through the first dichroic mirror and the second dichroic mirror and is input to the chamber.

6. A plasma light source comprising:
a pulse laser generator configured to generate a pulse laser beam;
a continuous wave (CW) laser generator configured to generate an infrared ray (IR) CW laser beam;
a first dichroic mirror configured to selectively transmit or reflect the pulse laser beam and to selectively reflect or transmit the IR CW laser beam;
a chamber configured to receive the pulse laser beam to ignite plasma and the IR CW laser beam to maintain the plasma in an ignited state, and to discharge plasma light generated by the plasma; and
a second dichroic mirror configured to transmit the pulse laser beam and the IR CW laser beam and reflect the plasma light,
wherein the pulse laser beam is input to the chamber by reflection of the first dichroic mirror and transmission of the second dichroic mirror,
the IR CW laser beam passes through the first dichroic mirror and the second dichroic mirror and is input to the chamber,
a concave lens is disposed between the pulse laser generator and the first dichroic mirror, and
a cylindrical lens is disposed between the CW laser generator and the first dichroic mirror.

7. An inspection apparatus comprising:
a plasma light source including:
a first dichroic mirror configured to transmit or reflect a pulse laser beam and reflect or transmit an infrared ray (IR) continuous wave (CW) laser beam;
a chamber configured to receive the pulse laser beam to ignite plasma and the IR CW laser beam to maintain the plasma in an ignited state, and discharge plasma light generated by the plasma; and
a second dichroic mirror configured to transmit or reflect the pulse laser beam and the IR CW laser beam and reflect the plasma light, wherein the pulse laser beam is a ring-shaped beam and is input to the first dichroic mirror;

a first optical system configured to transfer the plasma light to an inspection object; and
a second optical system comprising an optical detector configured to detect light reflected from the inspection object.

8. The inspection apparatus of claim 7 , wherein the chamber is surrounded by an elliptical mirror and is disposed at a focus of the elliptical mirror,
the pulse laser beam and the IR CW laser beam are concentrated on the chamber by the elliptical mirror, and
the first dichroic mirror and the second dichroic mirror reflect or transmit light according to a wavelength, so that input light beams incident on the chamber are synthesized and an output light beam from the chamber is separated from the input light beams.

9. The inspection apparatus of claim 7 , wherein the chamber has no electrodes therein.

10. The inspection apparatus of claim 9 , further comprising a uniformizing device including a neutral density (ND) filter disposed between the plasma light source and the first optical system and configured to gradually reduce a transmittance of the plasma light toward a central area of a cross section perpendicular to a traveling direction of the plasma light.

11. The inspection apparatus of claim 10 , wherein the uniformizing device is a reflection structure that includes a combination of an elliptical mirror and a spherical mirror and reflects the plasma light in one direction,
the elliptical mirror has a structure that is opened in a direction of a homogenizer, the spherical mirror is opened in a first direction and a second direction, the first direction being directed toward the elliptical mirror and the second direction being directed toward the homogenizer, and
the reflection structure is configured such that an opened portion of the spherical mirror in the first direction is coupled to an opened portion of the elliptical mirror.

12. The inspection apparatus of claim 11 , wherein the spherical mirror is configured to reflect the plasma light, which is not reflected by the elliptical mirror, toward the elliptical mirror, and
the spherical mirror is configured to homogenize an intensity of the plasma light in the central area and the intensity of the plasma light in an outer peripheral area on a cross section perpendicular to the traveling direction of the plasma light.

13. The inspection apparatus of claim 7 , further comprising:
a uniformizing device including a reflection structure that includes a combination of an elliptical mirror and a spherical mirror and reflects the plasma light in one direction; and
a neutral density (ND) filter disposed between the reflection structure and the first optical system and configured to gradually reduce the transmittance of the plasma light toward a central area of a cross section perpendicular to a traveling direction of the plasma light.

14. The inspection apparatus of claim 7 , wherein the first optical system includes:
a collimation lens configured to collimate light output from a homogenizer into parallel light; and
an objective lens configured to irradiate the parallel light on the inspection object and receive light reflected from the inspection object, and
the inspection apparatus further comprises a beam splitter disposed between the collimation lens and the objective lens or between the homogenizer and the collimation lens to split the light irradiated on the inspection object and the light reflected from the inspection object.

Assignees

• Hashimoto Kohei
• Kimura Nobuyuki
• Kim Wook Rae
• Jeon Byeong Hwan
• Samsung Electronics Co Ltd

Inventors

• Hashimoto Kohei
• Kimura Nobuyuki
• Kim Wook-Rae
• Jeon Byeong-Hwan

Classifications

• H05G2/008

  involving an energy-carrying beam in the process of plasma generation · CPC title

• H01J61/025

  Associated optical elements · CPC title

• H01J65/04

  Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating {plasma display panels} · CPC title

• G01N21/956

  Inspecting patterns on the surface of objects {(contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20)} · CPC title

• G01N21/9501

  Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20) · CPC title