Vaporization system

Patent metadata

Field	Value
Publication number	US-9982883-B2
Application number	US-201514952773-A
Country	US
Kind code	B2
Filing date	Nov 25, 2015
Priority date	Dec 22, 2014
Publication date	May 29, 2018
Grant date	May 29, 2018

Abstract

The present invention makes it possible to reduce the size of a vaporization system by eliminating the need for conduits in the vaporization system, without it being necessary to form a flow path in order for a supply rate controller to be mounted inside a vaporizer, and is formed by a vaporizer that vaporizes a liquid material; a supply rate controller that controls a supply rate of the liquid material to the vaporizer; and a manifold block inside which an internal flow path is formed, and that has a device mounting surface on which both the vaporizer and the supply rate controller are mounted, wherein, as a result of the vaporizer and the supply rate controller being mounted on the device mounting surface, they are connected together via the flow path.

First claim

The invention claimed is:

1. A vaporization system comprising:
a vaporizer that vaporizes a liquid material;
a supply rate controller that controls a supply rate of the liquid material to the vaporizer; and
a manifold block configured in an elongated shape, inside which is formed an internal flow path having an intake port on a first end side along a longitudinal direction of the elongated shape and a discharge port on a second end side opposite the first end side along the longitudinal direction, and that has a device mounting surface on which both the vaporizer and the supply rate controller are mounted, wherein
the vaporizer and the supply rate controller are arranged along the longitudinal direction of the elongated shape, and
as a result of the vaporizer and the supply rate controller being mounted on the device mounting surface, the vaporizer and the supply rate controller are connected together via the flow path.

2. The vaporization system according to claim 1 , wherein there is further provided a preheater that preheats the liquid material that is supplied to the vaporizer to a predetermined temperature, and,
by mounting the preheater on the device mounting surface, the preheater is connected to the vaporizer and the supply rate controller via the flow path.

3. The vaporization system according to claim 1 , wherein there are further provided:
a fluid detector that detects physical quantities relating to the flow rate of the vaporized gas created by the vaporizer; and
a flow rate control valve that controls the flow rate of the vaporized gas created by the vaporizer, wherein
by mounting the fluid detector and the flow rate control valve on the device mounting surface, the fluid detector and the flow rate control valve are connected to the vaporizer via the flow path.

4. The vaporization system according to claim 3 , wherein the manifold block is constructed by connecting together a first body unit onto which the vaporizer and the supply rate controller are mounted, and a second body unit onto which the fluid detector and the flow rate control valve are mounted.

5. The vaporization system according to claim 4 , wherein
a first heater that heats the first body unit is provided in the first body unit, and
a second heater that heats the second body unit is provided in the second body unit.

6. The vaporization system according to claim 1 , wherein a liquid level sensor that detects the liquid level of the liquid material is provided inside the vaporizer, and
vaporization is performed continuously by supplying the liquid material to the vaporizer by opening the supply rate controller intermittently in accordance with the liquid level of the liquid material that is detected by the liquid level sensor.

Assignees

• Horiba Stec Co Ltd

Inventors

• Taguchi Akihiro
• Hamada Masashi
• Yada Hidetaka

Classifications

• F22D5/30 Primary

  responsive to both water level and amount of steam withdrawn or steam pressure · CPC title

• F22D5/34

  Applications of valves · CPC title

• C23C16/4485 Primary

  by evaporation without using carrier gas in contact with the source material (C23C16/4486 takes precedence) · CPC title

• F22B1/285

  the water being fed by a pump to the reservoirs · CPC title