Process for removing a coating from workpieces
US-9512539-B2 · Dec 6, 2016 · US
US9982360B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9982360-B2 |
| Application number | US-201414486678-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 15, 2014 |
| Priority date | Sep 17, 2013 |
| Publication date | May 29, 2018 |
| Grant date | May 29, 2018 |
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A method for transferring a graphene layer from a metal substrate to a second substrate is provided comprising: providing a graphene layer on the metal substrate, adsorbing hydrogen atoms on the metal substrate by passing protons through the graphene layer, treating the metal substrate having adsorbed hydrogen atoms thereon in such a way as to form hydrogen gas from the adsorbed hydrogen atoms, thereby detaching the graphene layer from the metal substrate, transferring the graphene layer to the second substrate, and optionally reusing the metal substrate by repeating the aforementioned steps.
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What is claimed is: 1. A method for transferring a graphene layer from a metal substrate to a second substrate, comprising: a. providing a graphene layer on a metal substrate; b. adsorbing hydrogen atoms on the metal substrate by passing protons through the graphene layer by providing a photo acid generator material in contact with the graphene layer, the photo acid generator material being configured to generate protons upon exposure to a certain light, and exposing the photo acid generator material to the certain light, thereby generating the protons; c. treating the metal substrate having adsorbed hydrogen atoms thereon so as to form hydrogen gas from the adsorbed hydrogen atoms, thereby detaching the graphene layer from the metal substrate; and d. transferring the graphene layer to a second substrate. 2. The method of claim 1 , further comprising: e. reusing the metal substrate by repeating steps a through d. 3. The method of claim 1 , wherein the metal substrate comprises a transition metal or an alloy of transition metals. 4. The method of claim 3 , wherein the metal substrate is selected from the group consisting of a Cu substrate, a Ru substrate, an Ir substrate, and a Pt substrate. 5. The method of claim 3 , wherein the metal substrate is a Pt substrate. 6. The method of claim 1 , wherein the graphene layer is a graphene monolayer. 7. The method of claim 1 , wherein the protons are passed electrically through the graphene layer. 8. The method of claim 7 , wherein the metal substrate is an electrode in an electrochemical cell. 9. The method of claim 7 , wherein, during step b, one or more of a current and a voltage is set to a level so as to provide the protons without generating hydrogen gas bubbles larger than 1 μm. 10. The method of claim 1 , wherein, after step b and before step d, a second substrate is physically contacted with the graphene layer. 11. The method of claim 1 , wherein, after step b and before step c, a second substrate is physically contacted with the graphene layer. 12. The method of claim 1 , wherein, after step b and before step d, a second substrate is physically contacted with the photo acid generator. 13. The method of claim 1 , wherein, after step b and before step c, a second substrate is physically contacted with the photo acid generator. 14. The method of claim 1 , wherein step c comprises heating the metal substrate to a temperature sufficient for forming the hydrogen gas. 15. The method of claim 10 , wherein, during step c, the second substrate is pressed against the graphene layer with a pressure of at least 1.5 bars. 16. The method of claim 12 , wherein, during step c, the second substrate is pressed against the photo acid generator with a pressure of at least 1.5 bars.
by direct semiconductor to semiconductor bonding · CPC title
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Electrolytic stripping of metallic layers or coatings · CPC title
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