Composition and method of forming the same

US9982211B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9982211-B2
Application numberUS-201415101704-A
CountryUS
Kind codeB2
Filing dateDec 4, 2014
Priority dateDec 6, 2013
Publication dateMay 29, 2018
Grant dateMay 29, 2018

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  5. First independent claim

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Abstract

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A composition comprises the reaction product of a dithiophosphate derivative and an amine. The reaction product is present in the composition in an amount of at least about 25 wt. %. The composition may include additional components. A method of forming the composition comprises the step of combining the dithiophosphate derivative and the amine to form the composition. A method of increasing thermal stability of a dithiophosphate derivative comprises the step of combining the dithiophosphate derivative and an amine. The dithiophosphate derivative can decompose to form hydrogen sulfide (H2S). However, the amine substantially prevents thermal decomposition of the dithiophosphate derivative. An example of the dithiophosphate derivative is 3-(di-isobutoxy-thiophosphorylsulfanyl)-2-methyl-propanoic acid. An example of the amine is ditridecyl amine. The composition can be used for a variety of applications. For example, the composition can be used as an antiwear compound/additive in lubricants, metalworking fluids, hydraulic fluids, etc.

First claim

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What is claimed is: 1. A composition comprising: a reaction product of: a dithiophosphate derivative of general formula (I): wherein R 1 and R 2 independently of one another are C 3 -C 18 alkyl, C 5 -C 12 cycloalkyl, C 5 -C 6 cycloalkylmethyl, C 9 -C 10 bicycloalkylmethyl, C 9 -C 10 tricycloalkylmethyl, phenyl, or C 7 -C 24 alkylphenyl, alternatively R 1 and R 2 together are (CH 3 ) 2 C(CH 2 ) 2 ; R 3 is hydrogen or methyl; and the sum of n+m is at least 1, and a ditridecyl amine; wherein the reaction product comprises an amine salt and is present in an amount of at least about 25 wt. %. 2. The composition as set forth in claim 1 , wherein the reaction product is present in an amount of at least about 50 wt. %. 3. The composition as set forth in claim 1 , wherein the reaction product is present in an amount of at least about 75 wt. %. 4. The composition as set forth in claim 1 , wherein R 1 and R 2 independently of one another are C 3 -C 18 alkyl, C 5 -C 6 cycloalkyl, or C 7 -C 18 alkylphenyl. 5. The composition as set forth in claim 1 , wherein R 3 is hydrogen and the sum of n+m is from 1 to 25. 6. The composition as set forth in claim 1 , wherein said dithiophosphate derivative is β-dithiophosphorylated propionic acid. 7. The composition as set forth in claim 1 , further comprising free dithiophosphate derivative. 8. The composition as set forth in claim 1 , meeting Occupational Safety & Health Administration (OSHA) Standard 29 CFR 1910.1000, TABLE Z-2 for hydrogen sulfide (H 2 S) exposure which requires that exposures not exceed 20 parts per million (ppm) subject to an exception that if no other measurable exposure occurs during an 8-hour work shift, exposures may exceed 20 ppm, but not more than 50 ppm, for a single time period up to 10 minutes. 9. The composition as set forth in claim 1 as an antiwear additive. 10. A method of forming the composition as set forth in claim 1 , said method comprising a step of combining the dithiophosphate derivative and the ditridecyl amine to form the composition. 11. A method of increasing thermal stability of a dithiophosphate derivative that decomposes to form hydrogen sulfide (H 2 S), said method comprising a step of combining a dithiophosphate derivative of general formula (I): wherein R 1 and R 2 independently of one another are C 3 -C 18 alkyl, C 5 -C 12 cycloalkyl, C 5 -C 6 cycloalkylmethyl, C 9 -C 10 bicycloalkylmethyl, C 9 -C 10 tricycloalkylmethyl, phenyl, or C 7 -C 24 alkylphenyl, alternatively R 1 and R 2 together are (CH 3 ) 2 C(CH 2 ) 2 ; R 3 is hydrogen or methyl; and the sum of n+m is at least 1, and a ditridecyl amine; wherein the ditridecyl amine substantially prevents thermal decomposition of the dithiophosphate derivative. 12. The method as set forth in claim 10 , wherein a decomposition temperature of the dithiophosphate derivative is at least about 60° C. 13. The method as set forth in claim 10 , wherein after the step of combining, H 2 S exposure from the dithiophosphate derivative does not exceed 10 ppm (15 mg/m3).

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What does patent US9982211B2 cover?
A composition comprises the reaction product of a dithiophosphate derivative and an amine. The reaction product is present in the composition in an amount of at least about 25 wt. %. The composition may include additional components. A method of forming the composition comprises the step of combining the dithiophosphate derivative and the amine to form the composition. A method of increasing th…
Who is the assignee on this patent?
Basf Se
What technology area does this patent fall under?
Primary CPC classification C10M159/123. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 29 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).