Selective sonication-assisted deposition method of inorganic particles and CHA zeolite membranes grown from seeded layers on substrates using the method and plate-like Si-CHA zeolite particles used for seed layer formation and manufacturing method of the same

US9981852B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9981852-B2
Application numberUS-201414224258-A
CountryUS
Kind codeB2
Filing dateMar 25, 2014
Priority dateApr 22, 2013
Publication dateMay 29, 2018
Grant dateMay 29, 2018

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  1. Title

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  2. Abstract

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Abstract

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Provided is a selective sonication-assisted deposition method of inorganic particles and CHA zeolite membranes grown from seeded uniform layers on substrates using the method and plate-like Si-CHA zeolite particles used for seed layer formation and manufacturing method of the same, in which thin inorganic particles may be selectively deposited on a substrate or on a support, and even a physical interaction between the deposited particles and supports (or substrates) alone allows for obtaining high surface coverage to form a uniform layer, which is critical in reproducible production of membranes of inorganic materials, such as zeolite, by secondary growth.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of selective sonication-assisted deposition, comprising: allowing plate shaped inorganic particles, dispersed among cubic inorganic particles, to reach a substrate through a clearance between the substrate and glasses sandwiching the substrate, wherein an amount of the plate-shaped inorganic particles is smaller than an amount of the cubic inorganic particles; and performing sonication on the plate-shaped inorganic particles which reached the substrate to uniformly deposit the plate-shaped inorganic particles on the substrate. 2. The method of claim 1 , wherein dimensions of the plate-shaped inorganic particles conform to the equations: 0.01 ≤ z x ≤ 0.5 0.1 ≤ x y ≤ 10 , where x is an average length of a particle among the plate-shaped inorganic particles, y is an average width of the particle, and z is an average height of the particle. 3. The method of claim 1 , wherein the substrate is plate-shaped or cylindrical. 4. The method of claim 1 , wherein the inorganic particles are CHA particles comprising Si-CHA particles, metal particles, or metal oxides, and the substrate comprises silicon, glass, alumina, stainless steel, polymer, metal, or a metal oxide.

Assignees

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Classifications

  • to stabilize the total catalyst structure · CPC title

  • C01B39/48Primary

    using at least one organic template directing agent · CPC title

  • characterised by the method for obtaining this coating or impregnating · CPC title

  • containing any type of zeolite · CPC title

  • Synthetic zeolitic molecular sieves · CPC title

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What does patent US9981852B2 cover?
Provided is a selective sonication-assisted deposition method of inorganic particles and CHA zeolite membranes grown from seeded uniform layers on substrates using the method and plate-like Si-CHA zeolite particles used for seed layer formation and manufacturing method of the same, in which thin inorganic particles may be selectively deposited on a substrate or on a support, and even a physical…
Who is the assignee on this patent?
Univ Korea Res & Bus Found
What technology area does this patent fall under?
Primary CPC classification C01B39/48. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 29 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).