Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process

Patent metadata

Field	Value
Publication number	US-9977330-B2
Application number	US-201514856094-A
Country	US
Kind code	B2
Filing date	Sep 16, 2015
Priority date	Jun 18, 2012
Publication date	May 22, 2018
Grant date	May 22, 2018

Abstract

The invention provides a compound for forming an organic film having a partial structure represented by the following formula (vii-2),

wherein R 1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R 1 may be substituted by an oxygen atom; a+b is 1, 2 or 3; c and d are each independently 0, 1 or 2; x represents 0 or 1, when x=0, then a=c=0; L 7 represents a linear, branched or cyclic divalent organic group having 1 to 20 carbon atoms, L 8′ represents the partial structure represented by the following formula (i), 0≤o<1, 0<p≤1 and o+p=1,

wherein the ring structures Ar3 represent a substituted or unsubstituted benzene ring or naphthalene ring; R 0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; and L 0 represents a divalent organic group. There can be provided an organic film composition for forming an organic film having high dry etching resistance as well as advanced filling/planarizing characteristics.

First claim

What is claimed is:

1. A compound for forming an organic film, wherein the compound contains a polymer having a partial structure represented by the following formula (vii-2),

wherein R 1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R 1 may be substituted by an oxygen atom; a+b is 1, 2 or 3; c and d are each independently 0, 1 dr 2; x represents 0 or 1, when x=0, then a=c=0; L 7 represents a linear, branched or cyclic divalent organic group having 1 to 20 carbon atoms, L 8′ represents the partial structure represented by the following formula (i), 0≤o<1, 0<p≤1 and o+p=1,

wherein the ring structures Ar3 represent a substituted or unsubstituted benzene ring or naphthalene ring; R 0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; and L 0 represents a divalent organic group selected from the following:

2. An organic film composition comprising the compound for forming an organic film according to claim 1 , the organic film composition further comprising at least one selected from the group consisting of (A) a compound represented by the following formula (iii), (B) a compound having a partial structure represented by the following formula (iv), (C-1) a polymer compound having a partial structure represented by the following formula (iv) as a part of the repeating unit, (C-2) a polymer compound having a partial structure represented by the following formula (v), (C-3) a polymer compound having a partial structure represented by the following formula (vi), and (C-4) a polymer compound having a partial structure represented by the following formula (vii),
wherein the formula (iii) is represented by

wherein R 1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R 1 may be substituted by an oxygen atom; a+b and a′+b′ are each independently 1, 2 or 3; c, d, c′ and d′ are each independently 0, 1 or 2; x and y each independently represent 0 or 1, when x=0, then a=c=0, and when y=0, then a′=c′=0; and L represents a partial structure represented by the formula (ii),
the formula (iv) is represented by

wherein R 1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R 1 may be substituted by an oxygen atom; c, d, c′ and d′ are each independently 0, 1 or 2; x and y each independently represent 0 or 1, when x=0, then c=0, and when y=0, then c′=0; L represents a partial structure represented by the formula (ii); L 2 represents a linear, branched or cyclic divalent organic group having 2 to 30 carbon atoms; and a methylene group constituting L 2 may be substituted by an oxygen atom or a carbonyl group, and a hydrogen atom of the methylene group constituting L 2 may be substituted by a hydroxyl group,
the formula (v) is represented by

wherein R 1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R 1 may be substituted by an oxygen atom; a+b and a′+b′ are each independently 1, 2 or 3; c, d, c′ and d′ are each independently 0, 1 or 2; x and y each independently represent 0 or 1, when x=0, then a=c=0, and when y=0, then a′=c′=0; and L represents a partial structure represented by the formula (ii); L 3 represents a linear, branched or cyclic divalent organic group having 1 to 20 carbon atoms, L 4 represents L 3 , the partial structure represented by the following formula (i), or the partial structure represented by the formula (ii), 0≤i≤1, 0≤j≤1 and i+j=1,

wherein Ar3, R 0 and L 0 have the same meanings as defined in claim 1 ,
the formula (vi) is represented by

wherein R 1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R 1 may be substituted by an oxygen atom; a+b and a′+b′ are each independently 1, 2 or 3; c, d, c′ and d′ are each independently 0, 1 or 2; x and y each independently represent 0 or 1, when x=0, then a=c=0, and when y=0, then a′=c′=0; L 5 represents a linear, branched or cyclic divalent organic group having 1 to 20 carbon atoms, L 6 represents the partial structure represented by the formula (ii), 0≤m<1, 0<n≤1 and m+n=1,
the formula (vii) is represented by

wherein R 1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R 1 may be substituted by an oxygen atom; a+b is 1, 2 or 3; c and d are each independently 0, 1 or 2; x represents 0 or 1, when x=0, then a=c=0; L 7 represents a linear, branched or cyclic divalent organic group having 1 to 20 carbon atoms, L 8 represents the partial structure represented by the formula (ii), 0≤o<1, 0<p≤1 and o+p=1, and
the formula (ii) is represented by

wherein the ring structures Ar1, and Ar2 each represent a substituted or unsubstituted benzene ring or naphthalene ring; e is 0 or 1; R 0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; and L 0 has the same meaning as defined in claim 1 .

3. The organic film composition according to claim 2 , wherein the composition contains (D) a resin containing an aromatic ring which is different from the polymers (C-1) to (C-4).

4. The organic film composition according to claim 3 , wherein (D) the resin containing an aromatic ring contains a naphthalene ring.

5. The organic film composition according to claim 3 , wherein (D) the resin containing an aromatic ring contains a resin (D-1) obtained by polycondensating one or more compounds represented by the following formulae (3a) and (3b), and a compound represented by the following formula (4),

wherein each R 2 independently represent a hydrogen atom or a saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms; each R 3 independently represent a benzene ring or a naphthalene ring; m1+m2, m3+m4 and m5+m6 are each 1 or 2; n1, n2 and n3 are each 0 or 1,
A-CHO  (4)

wherein A represents a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, or a substituted or unsubstituted aromatic hydrocarbon group having 6 to 20 carbon atoms.

6. The organic film composition according to claim 3 , wherein (D) the resin containing an aromatic ring contains a resin (D-2) having one or more of a repeating unit(s) represented by the following formula (5),

Assignees

• Shinetsu Chemical Co

Inventors

• Tachibana Seiichiro
• Kori Daisuke
• Ogihara Tsutomu
• Watanabe Takeru
• Noda Kazumi
• Yano Toshiharu

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• H10P50/73

  using masks for insulating materials · CPC title

• H10P76/2043

  using an anti-reflective coating · CPC title

• H10P76/20

  of masks comprising organic materials · CPC title

• H10P50/695

  characterised by the process involved to create the mask, e.g. lift-off masks or sidewalls or to modify the mask · CPC title