Chemical vapor deposition functionalization

US9975143B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9975143-B2
Application numberUS-201414784731-A
CountryUS
Kind codeB2
Filing dateMay 14, 2014
Priority dateMay 14, 2013
Publication dateMay 22, 2018
Grant dateMay 22, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor deposition functionalization is not of a refrigerator shelf or a windshield.

First claim

Opening claim text (preview).

What is claimed is: 1. A chemical vapor functionalized article, comprising: a chemical vapor functionalization on a material, the material including an sp 3 arrangement of carbon; wherein the chemical vapor functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof; wherein the chemical vapor functionalization is from a single functionalizing step or wherein the chemical vapor functionalization is from a first functionalizing step, followed by a nitrogen fill at partial pressure, followed by a purge, followed by a second functionalizing step. 2. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalized article is not a refrigerator shelf or a windshield. 3. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalization has a contact angle for deionized water on a mirror diamond-like carbon surface that is greater than polytetrafluoroethylene by at least about 10°. 4. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalization has a water contact angle of greater than 110°. 5. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalization has a hexadecane contact angle of greater than 70°. 6. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalization has a property of being capable of maintaining a water contact angle of greater than above 123° over 23.5 hours. 7. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalization has a property of being capable of maintaining a hexadecane contact angle of greater than above 60° over 23.5 hours. 8. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalization has an increased contact angle in comparison to the material. 9. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalization is formed by (heptadecafluoro-1,1,2,2-tetrahydrodecycl)trimethoxysilane. 10. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalization is formed by (tridecafluoro-1,1,2,2-tetrahydrooctyl)triethoxysilane. 11. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalization is from the single functionalizing step. 12. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalization is from the first functionalizing step, followed by the nitrogen fill at the partial pressure, followed by the purge, followed by the second functionalizing step. 13. The chemical vapor functionalized article of claim 12 , wherein the first functionalization step and the second functionalization step are from temperature conditions within a chemical vapor of between 250° C. and 350° C. 14. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalization is from functionalizing within a chemical vapor for over 1 hour. 15. The chemical vapor functionalized article of claim 1 , wherein the chemical vapor functionalized article has a structure selected from the group consisting of a tube, a pipe, a fixture, a needle, a wafer, a column, a container, a fitting, a piston, a ring, a cylinder, a bearing, a ball, a roller bearing, a tool, a stent, or a combination thereof. 16. The chemical vapor functionalized article of claim 1 , wherein the material is an intermediate layer or a coating. 17. The chemical vapor functionalized article of claim 1 , wherein the material is a substrate. 18. A chemical vapor fluoro-functionalized article, comprising: a chemical vapor fluoro-functionalization on a material, wherein the material is a substrate selected from the group consisting of a metal substrate, a metallic substrate, a stainless steel substrate, a ceramic matrix composite substrate, a ceramic substrate, a composite metal substrate, a fiber substrate, a foil substrate, and combinations thereof; and wherein the chemical vapor fluoro-functionalized article has a structure selected from the group consisting of a tube, a pipe, a fixture, a needle, a wafer, a column, a container, a fitting, a piston, a ring, a cylinder, a bearing, a ball, a roller bearing, a tool, a stent, or a combination thereof; wherein the chemical vapor fluoro-functionalization is from a single functionalizing step or wherein the functionalization is from a first functionalizing step, followed by a nitrogen fill at partial pressure, followed by a purge, followed by a second functionalizing step. 19. A chemical vapor process, comprising: chemical vapor functionalizing on a material; wherein the chemical vapor functionalizing is on a surface positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof; wherein the chemical vapor functionalization is from a single functionalizing step or wherein the chemical vapor functionalization is from a first functionalizing step, followed by a nitrogen fill at partial pressure, followed by a purge, followed by a second functionalizing step.

Assignees

Inventors

Classifications

  • B05D1/60Primary

    Deposition of organic layers from vapour phase (vapour phase deposition in general C23C14/00, C23C16/00) · CPC title

  • Anti-corrosive paints · CPC title

  • involving the use of fluoropolymers · CPC title

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Frequently asked questions

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What does patent US9975143B2 cover?
Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor deposition funct…
Who is the assignee on this patent?
Silcotek Corp
What technology area does this patent fall under?
Primary CPC classification B05D1/60. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 22 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).