Deposition mask and method of manufacturing the same

US9975134B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9975134-B2
Application numberUS-201514873035-A
CountryUS
Kind codeB2
Filing dateOct 1, 2015
Priority dateMar 15, 2011
Publication dateMay 22, 2018
Grant dateMay 22, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A deposition mask comprises a mask frame having an open window defined in a center thereof, a first mask sheet placed on the mask frame and including a plurality of open regions and a separation region which separates the open regions, and a second mask sheet placed on the first mask sheet and including a first aperture portion in a region which contacts the separation region of the first mask sheet.

First claim

Opening claim text (preview).

What is claimed is: 1. A deposition mask, comprising: a mask frame having an open deposition window; a mask sheet placed on the mask frame to overlap the open deposition window and including a plurality of aperture portions which comprise a first aperture portion and a second aperture portion; and a filler physically and internally filling an inside portion of the first aperture portion of the mask sheet, wherein the mask sheet and the filler are formed of different materials. 2. The deposition mask of claim 1 , wherein the first aperture portion comprises a plurality of apertures, and wherein the filler is arranged within and fills all of the apertures arranged within the first aperture portion. 3. The deposition mask of claim 1 , wherein the second aperture portion includes a plurality of apertures, apertures of the second aperture portion form a plurality of pattern regions, and the pattern regions are arranged in a matrix form. 4. The deposition mask of claim 3 , wherein the first aperture portion includes a plurality of apertures, and each aperture of the first aperture portion has a same shape as each aperture of the second aperture portion. 5. The deposition mask of claim 4 , wherein all apertures, including the apertures of the first aperture portion and the apertures of the second aperture portion, are evenly arranged in row and column directions. 6. The deposition mask of claim 1 , wherein the mask sheet is divided into a plurality of unit mask sheets. 7. The deposition mask of claim 1 , wherein the mask sheet is undivided. 8. The deposition mask of claim 1 , wherein the mask sheet is tensile-welded to the mask frame. 9. The deposition mask of claim 1 , wherein none of the apertures arranged within the second aperture portion include the filler within, wherein the apertures within the second aperture portion are configured to allow for evaporated deposition material during a deposition process to pass therethrough to form a pattern on a substrate arranged on an opposite side of the deposition mask from a deposition source, while the filler blocks any deposition material from reaching the substrate at locations corresponding to the first aperture portion. 10. The deposition mask of claim 1 , wherein each of the mask sheet and the filler are comprised of nickel, the mask sheet being tensile-welded to the mask frame.

Assignees

Inventors

Classifications

  • Masking devices (stencils B05C17/06; masking devices for which the means for applying liquids or other fluent material is spraying or is not important B05B12/20) · CPC title

  • Manufacture or joining of vessels, leading-in conductors or bases · CPC title

  • Assembling or joining · CPC title

  • Sealing, e.g. seals specially adapted for leading-in conductors · CPC title

  • C23C14/042Primary

    using masks · CPC title

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Frequently asked questions

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What does patent US9975134B2 cover?
A deposition mask comprises a mask frame having an open window defined in a center thereof, a first mask sheet placed on the mask frame and including a plurality of open regions and a separation region which separates the open regions, and a second mask sheet placed on the first mask sheet and including a first aperture portion in a region which contacts the separation region of the first mask …
Who is the assignee on this patent?
Samsung Display Co Ltd, Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 22 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).