Ultrasonic transducer electrode assembly

US9974518B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9974518-B2
Application numberUS-201615094717-A
CountryUS
Kind codeB2
Filing dateApr 8, 2016
Priority dateDec 31, 2012
Publication dateMay 22, 2018
Grant dateMay 22, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure provides a method of fabricating an ultrasound transducer. A substrate having a first side and a second side opposite the first side is provided. A bottom electrode is formed over the first side of the substrate. A piezoelectric element is formed over the bottom electrode. The piezoelectric element has a chamfered sidewall. A top electrode is formed over the piezoelectric element. A step metal element is formed over a portion of the top electrode proximate to the chamfered sidewall of the piezoelectric element.

First claim

Opening claim text (preview).

What is claimed is: 1. A micromachined ultrasound transducer, comprising: a substrate; a bottom electrode disposed over the substrate; a piezoelectric element disposed over the bottom electrode; a top electrode disposed over at least a top surface and a sidewall of the piezoelectric element; and a step metal element disposed over a sidewall of the top electrode. 2. The micromachined ultrasound transducer of claim 1 , wherein the step metal element and the top electrode have substantially similar material compositions. 3. The micromachined ultrasound transducer of claim 1 , wherein the piezoelectric element has a chamfer. 4. The micromachined ultrasound transducer of claim 1 , further comprising: a well disposed in the substrate. 5. The micromachined ultrasound transducer of claim 4 , wherein the well is at least partially filled with a backing material. 6. The micromachined ultrasound transducer of claim 4 , wherein portions of the top electrode, the bottom electrode, and the piezoelectric element disposed over the well each have an arcuate shape. 7. The micromachined ultrasound transducer of claim 1 , further comprising a dielectric layer disposed between the substrate and at least the bottom electrode. 8. The micromachined ultrasound transducer of claim 1 , wherein the piezoelectric element contains polyvinylidene fluoride (PVDF), polyvinylidene fluoride-trifluoroethylene (PVDF-TrFE), or polyvinylidene fluoride-tetrafluoroethlene (PVDF-TFE). 9. The micromachined ultrasound transducer of claim 1 , wherein the top electrode includes: a top segment disposed over the top surface of the piezoelectric element; a bottom segment disposed over the substrate, the bottom segment being non-planar with the top segment; and a via coupling the top segment to the bottom segment. 10. The micromachined ultrasound transducer of claim 9 , wherein the via is disposed directly on the bottom segment. 11. The micromachined ultrasound transducer of claim 9 , wherein the via includes a recessed portion of the top electrode. 12. An ultrasound system, comprising: an imaging component that includes a flexible elongate member and a piezoelectric micromachined ultrasound transducer (PMUT) coupled to a distal end of the elongate member, wherein the PMUT includes: a substrate having a front surface and a back surface opposite the first surface; a well located in the substrate, the well extending from the back surface of the substrate to, but not beyond, the front surface of the substrate, wherein the well is at least partially filled with a backing material; a transducer membrane disposed over the well, wherein the transducer member includes a piezoelectric element disposed between a top electrode and a bottom electrode; and a step metal element disposed over a sidewall of the piezoelectric element; an interface module configured to engage with a proximal end of the elongate member; and an ultrasound processing component in communication with the interface module. 13. The ultrasound system of claim 12 , wherein the step metal element and the top electrode have substantially similar material compositions. 14. The ultrasound system of claim 12 , wherein the piezoelectric element has a chamfer. 15. The ultrasound system of claim 12 , wherein portions of the transducer membrane disposed over the well has an arcuate profile. 16. The ultrasound system of claim 12 , further comprising a dielectric layer disposed between the substrate and the bottom electrode. 17. The ultrasound system of claim 12 , wherein the piezoelectric element contains polyvinylidene fluoride (PVDF), polyvinylidene fluoride-trifluoroethylene (PVDF-TrFE), polyvinylidene fluoride-tetrafluoroethlene (PVDF-TFE) or sol-gel formed piezoelectric materials. 18. The ultrasound system of claim 12 , wherein the top electrode includes: a top segment disposed over a top surface of the piezoelectric element; a bottom segment disposed over the substrate, the bottom segment being non-planar with the top segment; and a via coupling the top segment to the bottom segment. 19. The ultrasound system of claim 18 , wherein the via is disposed directly on the bottom segment. 20. The ultrasound system of claim 18 , wherein the via includes a recessed portion of the top electrode.

Assignees

Inventors

Classifications

  • Electricity · mapped topic

  • Electricity · mapped topic

  • Electricity · mapped topic

  • A61B8/4483Primary

    characterised by features of the ultrasound transducer · CPC title

  • in body cavities or body tracts, e.g. by using catheters · CPC title

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Frequently asked questions

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What does patent US9974518B2 cover?
The present disclosure provides a method of fabricating an ultrasound transducer. A substrate having a first side and a second side opposite the first side is provided. A bottom electrode is formed over the first side of the substrate. A piezoelectric element is formed over the bottom electrode. The piezoelectric element has a chamfered sidewall. A top electrode is formed over the piezoelectric…
Who is the assignee on this patent?
Volcano Corp
What technology area does this patent fall under?
Primary CPC classification A61B8/4483. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue May 22 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).