Exposure device, substrate processing apparatus, exposure method for substrate and substrate processing method

Patent metadata

Field	Value
Publication number	US-9972516-B2
Application number	US-201615079153-A
Country	US
Kind code	B2
Filing date	Mar 24, 2016
Priority date	Mar 25, 2015
Publication date	May 15, 2018
Grant date	May 15, 2018

Abstract

A local transport hand is configured to be movable in a front-and-rear direction between a rear position rearward of a light emitter and a front position forward of the light emitter. A substrate on which a DSA film is formed is placed on an upper surface of the local transport hand. Vacuum ultraviolet rays having strip-shape cross sections are emitted from the light emitter to cross a moving path of the local transport hand. The local transport hand is moved from the front position to the rear position such that the DSA film on the substrate is irradiated with the vacuum ultraviolet rays emitted by the light emitter. At this time, a moving speed of the substrate is controlled, so that an exposure value for the DSA film formed on the substrate is adjusted.

First claim

We claim:

1. An exposure device that exposes a substrate, comprising:
a holder that holds the substrate having one surface on which a film having a predetermined pattern is formed;
an emitter that emits light for reforming the film;
a relative mover that moves at least one of the holder and the emitter in one direction relative to another one such that the one surface of the substrate held by the holder is irradiated with light emitted by the emitter;
an illumination intensity detector that detects illumination intensity of light with which the substrate is irradiated by the emitter; and
a controller that calculates a moving speed for acquiring a predetermined exposure value based on the illumination intensity detected by the illumination intensity detector such that an exposure value for the film is the predetermined exposure value, and controls the relative mover such that the holder and the emitter are relatively moved at the calculated moving speed,
wherein the illumination intensity detector includes
a light receiving element that receives light emitted by the emitter, and
a light blocking mechanism configured to be switchable between a first state in which light emitted by the emitter is incident on the light receiving element and a second state in which light emitted by the emitter is not incident on the light receiving element, and
the controller switches the light blocking mechanism to the first state during detection of the illumination intensity, and switches the light blocking mechanism to the second state during the irradiation of the substrate with light by the emitter.

2. The exposure device according to claim 1 , wherein
the relative mover moves the holder in one direction relative to the emitter during irradiation of the substrate with light by the emitter,
the illumination intensity detector further includes
a light receiving element moving mechanism that moves the light receiving element, and
the light receiving element moving mechanism moves the light receiving element to a position that does not interfere with the substrate during the irradiation of the substrate with light by the emitter, and moves the light receiving element onto a moving path of the substrate by the relative mover during detection of illumination intensity except for a period in which the substrate is being irradiated with light.

3. The exposure device according to claim 1 , wherein
light from the emitter with which the substrate is irradiated includes vacuum ultraviolet rays.

4. A substrate processing apparatus, comprising:
the exposure device according to claim 1 ;
a coating processor that forms the film on the one surface of the substrate by applying a processing liquid including a directed self assembly material to the one surface of the substrate before irradiation with light by the exposure device;
a thermal processor that performs thermal processing on the substrate after formation of the film by the coating processor and before irradiation with light by the exposure device; and
a development processor that performs development processing for the film by supplying a solvent to the one surface of the substrate after irradiation with light by the exposure device.

5. An exposure device comprising:
a holder that holds the substrate having one surface on which a film having a predetermined pattern is formed;
an emitter that emits light for reforming the film;
a relative mover that moves at least one of the holder and the emitter in one direction relative to another one such that the one surface of the substrate held by the holder is irradiated with light emitted by the emitter;
a controller that controls relative moving speed of the holder and the emitter by the relative mover such that an exposure value for the film is a predetermined exposure value;
a casing that stores the substrate held by the holder;
an inert gas supplier that supplies an inert gas to an inside of the casing; and
a concentration detector that detects an oxygen concentration in the casing,
wherein the light from the emitter with which the substrate is irradiated is vacuum ultraviolet rays, and
the controller controls the emitter and the relative mover such that, when the oxygen concentration detected by the concentration detector is not more than a predetermined processing concentration such that ozone generated by oxygen that remains in a path of the vacuum ultraviolet rays is reduced, the substrate is irradiated with the vacuum ultraviolet rays emitted by the emitter.

6. A substrate processing apparatus comprising:
the exposure device according to claim 5 ;
a coating processor that forms the film on the one surface of the substrate by applying a processing liquid including a directed self assembly material to the one surface of the substrate before irradiation with light by the exposure device;
a thermal processor that performs thermal processing on the substrate after formation of the film by the coating processor and before irradiation with light by the exposure device; and
a development processor that performs development processing for the film by supplying a solvent to the one surface of the substrate after irradiation with light by the exposure device.

7. An exposure method for exposing a substrate including the steps of:
holding the substrate having one surface on which a film having a predetermined pattern is formed by a holder;
emitting light for reforming the film by an emitter;
moving at least one of the holder and the emitter in one direction relative to another one such that the one surface of the substrate held by the holder is irradiated with light emitted by the emitter;
detecting illumination intensity of light with which the substrate is irradiated by the emitter using a light receiving element that receives the light emitted by the emitter;
calculating a moving speed for acquiring a predetermined exposure value based on the detected illumination intensity such that an exposure value for the film is the predetermined exposure value, and controlling relative moving speed of the holder and the emitter such that the holder and the emitter are relatively moved at the calculated moving speed; and
controlling a light blocking mechanism configured to be switchable between a first state in which light emitted from the emitter is incident on the light receiving element and a second state in which light emitted by the emitter is not incident on the light receiving element,
wherein the step of controlling the light blocking mechanism includes switching the light blocking mechanism to the first state during detection of the illumination intensity and switching the light blocking mechanism to the second state during irradiation of the substrate with light by the emitter.

8. The exposure method according to claim 7 , wherein
the step of relatively moving is moving the holder in one direction relative to the emitter, and
the step of detecting the illumination intensity includes
moving the light receiving element to a position that does not interfere with the substrate during irradiation of the substrate with light by the emitter, and
moving the light receiving element onto a moving path of the substrate moved by the holder during detection of illumination intensity except for a period in which the substrate is being irradiated with light.

9. A substrate processing method including:
the exposure method according to claim 7 ;
the step of forming the film on the one surface of the substrate by applying a processing liquid including a directed self assembly material to the one surface of the substrate before irradiation with light by the exposure method;
the step of performing thermal processing on the substrate

Assignees

• Screen Holdings Co Ltd

Inventors

• Miyagi Tadashi
• Nishi Koji
• Momma Toru

Classifications

• H10P72/3314

  Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers · CPC title

• H10P72/3306

  Horizontal transfer of a single workpiece · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0474 Primary

  comprising at least one lithography chamber · CPC title

• G03F7/70266

  Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title