Metal particle dispersion for electroconductive substrates, method for producing the same, and method for producing an electroconductive substrate

US9972413B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9972413-B2
Application numberUS-201314435561-A
CountryUS
Kind codeB2
Filing dateOct 10, 2013
Priority dateOct 15, 2012
Publication dateMay 15, 2018
Grant dateMay 15, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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The present invention is to provide a metal particle dispersion for electroconductive substrates, which has high dispersibility and dispersion stability and which is able to form a film that shows high electroconductivity after baking. Disclosed is a metal particle dispersion for electroconductive substrates, comprising metal particles, a dispersant and a solvent, wherein the dispersant is a graft copolymer having at least a constitutional unit represented by the following chemical formula (I) and a constitutional unit represented by the following chemical formula (II): (Symbols in the formulae are as described in the Description.)

First claim

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The invention claimed is: 1. A metal particle dispersion for electroconductive substrates, comprising metal particles, a dispersant and a solvent, wherein the dispersant is a graft copolymer comprising at least a constitutional unit represented by the following chemical formula (I) and a constitutional unit represented by the following chemical formula (II): wherein R 1 and R 1′ are each independently a hydrogen atom or a methyl group; “A” is a direct bond or a divalent linking group, and the divalent linking group as “A” is at least one selected from the group consisting of an alkylene group comprising 1 to 10 carbon atoms, an arylene group, a —CONH— group, a —COO— group, an ether group comprising 1 to 10 carbon atoms comprising the formula —R′—OR″— wherein R′ and R″ are each independently an alkylene group and combinations thereof; “L” is a direct bond or a divalent linking group, and the divalent linking group as “L” is at least one selected from the group consisting of an alkylene group, an alkylene group comprising a hydroxyl group, an arylene group, a —CONH— group, a —COO— group, a —NHCOO— group, an ether group (—O— group), a thioether group (—S— group) and combinations thereof; and “Polymer” is a polymer chain comprising at least one constitutional unit represented by the following chemical formula (IV) or (V): wherein R 4 is a hydrogen atom or a methyl group; R 5 is a hydrocarbon group optionally comprising a substituent group, a cyano group or a monovalent group represented by —[CH(R 6 )—CH(R 7 )—O] x —R 8 , —[(CH 2 ) y —O] z —R 8 , —[CO—(CH 2 ) y —O] z —R 8 , —CO—O—R 9 or —O—CO—R 10 ; R 6 and R 7 are each independently a hydrogen atom or a methyl group; R 8 is a hydrogen atom, a hydrocarbon group optionally comprising a substituent group, or a monovalent group represented by —CHO, —CH 2 CHO or —CH 2 COOR 11 ; R 9 is a hydrocarbon group optionally comprising a substituent group, a cyano group or a monovalent group represented by —[CH(R 6 )—CH(R 7 )—O] x —R 8 , —[(CH 2 ) y —O] z —R 8 or —[CO—(CH 2 ) y —O] z —R 8 ; R 10 is an alkyl group comprising 1 to 18 carbon atoms, and the alkyl group optionally comprises a substituent group; R 11 is a hydrogen atom or an alkyl group comprising 1 to 5 carbon atoms; the substituent group in R 5 , R 8 , R 9 and R 10 is at least one selected from the group consisting of a nitro group, a halogen atom, an alkoxy group, a hydroxyl group, a carboxyl group, an amino group, an epoxy group and an isocyanate group, and when R 5 , R 8 and R 9 are each a group comprising an aromatic ring, the aromatic ring optionally comprises a substituent group of an alkyl or alkenyl group; m is an integer of 1 to 5; n and n′ are each an integer of 5 to 200; x is an integer of 1 to 18; y is an integer of 1 to 5; and z is an integer of 1 to 18. 2. The metal particle dispersion for electroconductive substrates according to claim 1 , wherein the graft copolymer as the dispersant further comprises a constitutional unit represented by the following chemical formula (III): wherein R 1″ is a hydrogen atom or a methyl group; “A′” is a direct bond or a divalent linking group, and the divalent linking group as “A′” is at least one selected from the group consisting of an alkylene group comprising 1 to 10 carbon atoms, an arylene group, a —CONH— group, a —COO— group, an ether group comprising 1 to 10 carbon atoms comprising the formula —R′″—OR″″— wherein R′″ and R″″ are each independently an alkylene group and combinations thereof; and “Q” is a group represented by the following chemical formula (III-a) or a nitrogen-containing heterocyclic group which is able to form a salt with an acid or a halogenated hydrocarbon, and the nitrogen-containing heterocyclic group optionally comprises a substituent group which is at least one selected from the group consisting of a halogen atom, an alkyl group comprising 1 to 12 carbon atoms, an aralkyl group and an aryl group: wherein R 2 and R 3 are each independently a hydrogen atom or a hydrocarbon group which optionally contains a heteroatom; the hydrocarbon group optionally comprises a substituent group, and the substituent group in R 2 and R 3 is a halogen atom; and R 2 and R 3 can be the same as or different from each other. 3. The metal particle dispersion for electroconductive substrates according to claim 2 , wherein, in the graft copolymer as the dispersant, a salt is formed between at least a part of a nitrogen site contained in the constitutional unit represented by the chemical formula (III) and at least one selected from the group consisting of an acidic phosphorus compound, a sulfonic acid compound and a halogenated hydrocarbon. 4. The metal particle dispersion for electroconductive substrates according to claim 3 , wherein, in the dispersant, the acidic phosphorus compound is a compound represented by the following chemical formula (VI); the sulfonic acid compound is a compound represented by the following chemical formula (VII); and the halogenated hydrocarbon is one or more selected from the group consisting of a halogenated benzyl, a halogenated allyl and a halogenated methyl: wherein R a and R a′ are each independently a hydrogen atom, a hydroxyl group, a hydrocarbon group optionally comprising a substituent group, or a monovalent group represented by —[CH(R c )—CH(R d )—O] s —R e , —[(CH 2 ) t —O] u —R e or —O—R a″ ; R a″ is a hydrocarbon group optionally comprising a substituent group, or a monovalent group represented by —[CH(R c )—CH(R d )—O] s —R e , —[(CH 2 ) t —O] u —R e , —C(R f )(R g )—C(R h )(R i )—OH or —CH 2 —C(R j )(R k )—CH 2 —OH; R b is a hydrocarbon group optionally comprising a substituent group, or a monovalent group represented by —[CH(R c )—CH(R d )—O] s —R e , —[(CH 2 ) t —O] u —R e or —O—R b′ ; R b′ is a hydrocarbon group optionally comprising a substituent group, or a monovalent group represented by —[CH(R c )—CH(R d )—O] s —R e or —[(CH 2 ) t —O] u —R e ; R c and R d are each independently a hydrogen atom or a methyl group; R e is a hydrogen atom, a hydrocarbon group which optionally comprising a substituent group, or a monovalent group represented by —CHO, —CH 2 CHO, —CO—CH═CH 2 , —CO—C(CH 3 )═CH 2 or —CH 2 COOR e′ ; R e′ is a hydrogen atom or an alkyl group comprising 1 to 5 carbon atoms; R f , R g , R h , R i , R j and R k are each independently a hydrogen atom, a hydrocarbon group optionally comprising a substituent group, or a group in which hydrocarbon groups optionally comprising a substituent group are bound by at least one of an ether bond and an ester bond, and R f and R h can be bound to each other to form a cyclic structure; when the cyclic structure is formed, the cyclic structure optionally comprises a substituent group R l , and R l is a hydrogen atom, a hydrocarbon group optionally comprising a substituent group, or a group in which hydrocarbon groups optionally comprising a substituent group are bound by at least one of an ether bond and an ester bond; the substituent group in R a , R a′ , R a″ , R b , R b′ , R e , R f , R g , R h , R i , R j , R k and R l is at least one selected from the group consisting of a nitro group and a halogen atom, and when R a , R a′ , R a″ , R b , R b′ , R e , R f , R g , R h , R i , R j

Assignees

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Classifications

  • H01B1/22Primary

    the conductive material comprising metals or alloys · CPC title

  • in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern · CPC title

  • Electrically conductive inks · CPC title

  • to obtain a coating with specific electrical properties · CPC title

  • Firing, i.e. heating a powder or paste above the melting temperature of at least one of its constituents · CPC title

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What does patent US9972413B2 cover?
The present invention is to provide a metal particle dispersion for electroconductive substrates, which has high dispersibility and dispersion stability and which is able to form a film that shows high electroconductivity after baking. Disclosed is a metal particle dispersion for electroconductive substrates, comprising metal particles, a dispersant and a solvent, wherein the dispersant is a gr…
Who is the assignee on this patent?
Dainippon Printing Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01B1/22. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 15 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).