Systems, compositions, and methods for enhanced electromagnetic shielding and corrosion resistance
US-11965116-B2 · Apr 23, 2024 · US
US9972413B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9972413-B2 |
| Application number | US-201314435561-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 10, 2013 |
| Priority date | Oct 15, 2012 |
| Publication date | May 15, 2018 |
| Grant date | May 15, 2018 |
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The present invention is to provide a metal particle dispersion for electroconductive substrates, which has high dispersibility and dispersion stability and which is able to form a film that shows high electroconductivity after baking. Disclosed is a metal particle dispersion for electroconductive substrates, comprising metal particles, a dispersant and a solvent, wherein the dispersant is a graft copolymer having at least a constitutional unit represented by the following chemical formula (I) and a constitutional unit represented by the following chemical formula (II): (Symbols in the formulae are as described in the Description.)
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The invention claimed is: 1. A metal particle dispersion for electroconductive substrates, comprising metal particles, a dispersant and a solvent, wherein the dispersant is a graft copolymer comprising at least a constitutional unit represented by the following chemical formula (I) and a constitutional unit represented by the following chemical formula (II): wherein R 1 and R 1′ are each independently a hydrogen atom or a methyl group; “A” is a direct bond or a divalent linking group, and the divalent linking group as “A” is at least one selected from the group consisting of an alkylene group comprising 1 to 10 carbon atoms, an arylene group, a —CONH— group, a —COO— group, an ether group comprising 1 to 10 carbon atoms comprising the formula —R′—OR″— wherein R′ and R″ are each independently an alkylene group and combinations thereof; “L” is a direct bond or a divalent linking group, and the divalent linking group as “L” is at least one selected from the group consisting of an alkylene group, an alkylene group comprising a hydroxyl group, an arylene group, a —CONH— group, a —COO— group, a —NHCOO— group, an ether group (—O— group), a thioether group (—S— group) and combinations thereof; and “Polymer” is a polymer chain comprising at least one constitutional unit represented by the following chemical formula (IV) or (V): wherein R 4 is a hydrogen atom or a methyl group; R 5 is a hydrocarbon group optionally comprising a substituent group, a cyano group or a monovalent group represented by —[CH(R 6 )—CH(R 7 )—O] x —R 8 , —[(CH 2 ) y —O] z —R 8 , —[CO—(CH 2 ) y —O] z —R 8 , —CO—O—R 9 or —O—CO—R 10 ; R 6 and R 7 are each independently a hydrogen atom or a methyl group; R 8 is a hydrogen atom, a hydrocarbon group optionally comprising a substituent group, or a monovalent group represented by —CHO, —CH 2 CHO or —CH 2 COOR 11 ; R 9 is a hydrocarbon group optionally comprising a substituent group, a cyano group or a monovalent group represented by —[CH(R 6 )—CH(R 7 )—O] x —R 8 , —[(CH 2 ) y —O] z —R 8 or —[CO—(CH 2 ) y —O] z —R 8 ; R 10 is an alkyl group comprising 1 to 18 carbon atoms, and the alkyl group optionally comprises a substituent group; R 11 is a hydrogen atom or an alkyl group comprising 1 to 5 carbon atoms; the substituent group in R 5 , R 8 , R 9 and R 10 is at least one selected from the group consisting of a nitro group, a halogen atom, an alkoxy group, a hydroxyl group, a carboxyl group, an amino group, an epoxy group and an isocyanate group, and when R 5 , R 8 and R 9 are each a group comprising an aromatic ring, the aromatic ring optionally comprises a substituent group of an alkyl or alkenyl group; m is an integer of 1 to 5; n and n′ are each an integer of 5 to 200; x is an integer of 1 to 18; y is an integer of 1 to 5; and z is an integer of 1 to 18. 2. The metal particle dispersion for electroconductive substrates according to claim 1 , wherein the graft copolymer as the dispersant further comprises a constitutional unit represented by the following chemical formula (III): wherein R 1″ is a hydrogen atom or a methyl group; “A′” is a direct bond or a divalent linking group, and the divalent linking group as “A′” is at least one selected from the group consisting of an alkylene group comprising 1 to 10 carbon atoms, an arylene group, a —CONH— group, a —COO— group, an ether group comprising 1 to 10 carbon atoms comprising the formula —R′″—OR″″— wherein R′″ and R″″ are each independently an alkylene group and combinations thereof; and “Q” is a group represented by the following chemical formula (III-a) or a nitrogen-containing heterocyclic group which is able to form a salt with an acid or a halogenated hydrocarbon, and the nitrogen-containing heterocyclic group optionally comprises a substituent group which is at least one selected from the group consisting of a halogen atom, an alkyl group comprising 1 to 12 carbon atoms, an aralkyl group and an aryl group: wherein R 2 and R 3 are each independently a hydrogen atom or a hydrocarbon group which optionally contains a heteroatom; the hydrocarbon group optionally comprises a substituent group, and the substituent group in R 2 and R 3 is a halogen atom; and R 2 and R 3 can be the same as or different from each other. 3. The metal particle dispersion for electroconductive substrates according to claim 2 , wherein, in the graft copolymer as the dispersant, a salt is formed between at least a part of a nitrogen site contained in the constitutional unit represented by the chemical formula (III) and at least one selected from the group consisting of an acidic phosphorus compound, a sulfonic acid compound and a halogenated hydrocarbon. 4. The metal particle dispersion for electroconductive substrates according to claim 3 , wherein, in the dispersant, the acidic phosphorus compound is a compound represented by the following chemical formula (VI); the sulfonic acid compound is a compound represented by the following chemical formula (VII); and the halogenated hydrocarbon is one or more selected from the group consisting of a halogenated benzyl, a halogenated allyl and a halogenated methyl: wherein R a and R a′ are each independently a hydrogen atom, a hydroxyl group, a hydrocarbon group optionally comprising a substituent group, or a monovalent group represented by —[CH(R c )—CH(R d )—O] s —R e , —[(CH 2 ) t —O] u —R e or —O—R a″ ; R a″ is a hydrocarbon group optionally comprising a substituent group, or a monovalent group represented by —[CH(R c )—CH(R d )—O] s —R e , —[(CH 2 ) t —O] u —R e , —C(R f )(R g )—C(R h )(R i )—OH or —CH 2 —C(R j )(R k )—CH 2 —OH; R b is a hydrocarbon group optionally comprising a substituent group, or a monovalent group represented by —[CH(R c )—CH(R d )—O] s —R e , —[(CH 2 ) t —O] u —R e or —O—R b′ ; R b′ is a hydrocarbon group optionally comprising a substituent group, or a monovalent group represented by —[CH(R c )—CH(R d )—O] s —R e or —[(CH 2 ) t —O] u —R e ; R c and R d are each independently a hydrogen atom or a methyl group; R e is a hydrogen atom, a hydrocarbon group which optionally comprising a substituent group, or a monovalent group represented by —CHO, —CH 2 CHO, —CO—CH═CH 2 , —CO—C(CH 3 )═CH 2 or —CH 2 COOR e′ ; R e′ is a hydrogen atom or an alkyl group comprising 1 to 5 carbon atoms; R f , R g , R h , R i , R j and R k are each independently a hydrogen atom, a hydrocarbon group optionally comprising a substituent group, or a group in which hydrocarbon groups optionally comprising a substituent group are bound by at least one of an ether bond and an ester bond, and R f and R h can be bound to each other to form a cyclic structure; when the cyclic structure is formed, the cyclic structure optionally comprises a substituent group R l , and R l is a hydrogen atom, a hydrocarbon group optionally comprising a substituent group, or a group in which hydrocarbon groups optionally comprising a substituent group are bound by at least one of an ether bond and an ester bond; the substituent group in R a , R a′ , R a″ , R b , R b′ , R e , R f , R g , R h , R i , R j , R k and R l is at least one selected from the group consisting of a nitro group and a halogen atom, and when R a , R a′ , R a″ , R b , R b′ , R e , R f , R g , R h , R i , R j
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