Computing emission rate from gas density images
US-2024420311-A1 · Dec 19, 2024 · US
US9970865B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9970865-B2 |
| Application number | US-201514952735-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 25, 2015 |
| Priority date | Dec 2, 2014 |
| Publication date | May 15, 2018 |
| Grant date | May 15, 2018 |
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Provided is a decomposition detecting unit that despite a simple configuration, can detect whether or not decomposition occurs in material gas resulting from the vaporization of a semiconductor material. The decomposition detecting unit includes: an NDIR type or laser absorption spectroscopy type absorbance measuring mechanism that measures first absorbance, which is absorbance at a wavelength at which a semiconductor material absorbs light, and second absorbance, which is absorbance at a wavelength at which a material produced when the semiconductor material decomposes absorbs light, of mixed gas containing material gas resulting from the vaporization of the semiconductor material; and a decomposition detection part that detects the decomposition in the material gas on the basis of the ratio between first concentration calculated on the basis of the first absorbance and the second absorbance and second concentration calculated on the basis of the second absorbance.
Opening claim text (preview).
The invention claimed is: 1. A decomposition detecting unit comprising: a gas analyzer, that is an NDIR gas analyzer or laser absorption spectroscopic gas analyzer, that measures first absorbance and second absorbance of mixed gas containing material gas resulting from vaporization of a semiconductor material, the first absorbance being absorbance at a wavelength at which the semiconductor material absorbs light, the second absorbance being absorbance at a wavelength at which a material produced when the semiconductor material decomposes absorbs light; and a decomposition detector that detects the decomposition of the semiconductor material on a basis of the first absorbance and the second absorbance. 2. The decomposition detecting unit according to claim 1 , wherein the decomposition detector is configured to detect the decomposition of the semiconductor material on a basis of a result of comparing a ratio between the first absorbance and the second absorbance measured when the semiconductor material does not decompose and a current ratio between the first absorbance and the second absorbance. 3. The decomposition detecting unit according to claim 1 , wherein the decomposition detector is configured to detect the decomposition of the semiconductor material on a basis of a result of comparing a difference between the first absorbance and the second absorbance measured when the semiconductor material does not decompose and a current difference between the first absorbance and the second absorbance. 4. The decomposition detecting unit according to claim 1 , wherein the decomposition detector is configured to detect the decomposition of the semiconductor material when a respective trend of each of the first and second absorbances at the same time are different, the respective trends being one of an increase, a decrease, or no change. 5. The decomposition detecting unit according to claim 1 , wherein the gas analyzer is the NDIR gas analyzer and comprises: a measuring cell through which the mixed gas passes; a light source that emits light having a predetermined wavelength bandwidth to the measuring cell; a first filter that allows passing of, among light having passed through the measuring cell, light having the wavelength at which the semiconductor material absorbs light; a second filter that allows passing of, among the light having passed through the measuring cell, light having the wavelength at which the material produced when the semiconductor material decompose absorbs light; and a light detector that detects the light having passed through the first filter or the second filter. 6. The decomposition detecting unit according to claim 1 , wherein the gas analyzer is the laser absorption spectroscopic gas analyzer and comprises: a measuring cell through which the mixed gas passes; a light source that, to the measuring cell, emits a laser beam having the wavelength at which the semiconductor material absorbs light, and a laser beam having the wavelength at which the material produced when the semiconductor material decomposes absorbs light; and a light detector that detects the laser beams having passed through the measuring cell. 7. The decomposition detecting unit according to claim 1 , wherein the semiconductor material is organic metal. 8. A concentration measuring unit comprising: the decomposition detecting unit according to claim 1 , and a concentration calculator that on a basis of the first absorbance, calculates concentration of the material gas in the mixed gas. 9. A concentration control apparatus that is used for a bubbling system comprising: a tank adapted to contain a semiconductor material; an introduction pipe adapted to introduce carrier gas into the tank; and a lead-out pipe adapted to lead mixed gas containing the material gas and the carrier gas out of the tank, the concentration control apparatus comprising: the concentration measuring unit according to claim 8 ; a regulation valve that is provided in the lead-out pipe; and a valve controller that controls the regulation valve on a basis of preset target concentration and measured concentration of the material gas, the measured concentration being measured by the concentration measuring unit.
for analysing gases, e.g. multi-gas analysis · CPC title
and process controlling, not otherwise provided for · CPC title
Coherent sources; lasers · CPC title
by sensing the concentration of the mixture, e.g. measuring pH value · CPC title
using tunable lasers · CPC title
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