Movable evaporation source

US9970098B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9970098-B2
Application numberUS-201414559033-A
CountryUS
Kind codeB2
Filing dateDec 3, 2014
Priority dateDec 16, 2013
Publication dateMay 15, 2018
Grant dateMay 15, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A moveable evaporation source system may have an insulator disposed above a cathode support member, and a cathode support member disposed beneath the insulator and exerting an upward force on the insulator so that the upward force exerted by the cathode support member urges the insulator toward a down force source. A cathode may be placed between the insulator and the down force source and translated so that material liberated from the cathode may strike different portions of a workpiece as the cathode is translated.

First claim

Opening claim text (preview).

What is claimed is: 1. A moveable evaporation source system for vapor deposition of material on a workpiece comprising: a down force source configured to exert a variable force along an axis; a chamber wall configured to function as an anode; a cathode positioned between the down force source and a cathode support member, the cathode configured to translate along the axis in response to the variable force, the cathode having a first surface perpendicular to the axis, a second surface opposite the first surface and an evaporation surface between the first surface and the second surface and, the evaporation surface being parallel to the axis, wherein a liberated material travels from the evaporation surface along a path defined by a look angle and deposits at a top surface of a work piece, the top surface being parallel to the first and second surface, wherein the workpiece is fixed between the cathode and the anode, wherein the evaporation surface is above the top surface of the workpiece; and a cathode support member configured to exert an opposing force along the axis that opposes the variable force. 2. The moveable evaporation source system according to claim 1 , wherein the cathode support member comprises: a lower portion; an upper portion movable relative to the lower portion; and a force provider configured to urge the lower portion and the upper portion apart. 3. The moveable evaporation source system according to claim 2 , wherein the force provider is a spring disposed within the lower portion and the upper portion. 4. The moveable evaporation source system according to claim 2 , wherein the lower portion comprises slots and the upper portion comprises pins wherein the pins are disposed within the slots. 5. The system of claim 1 , wherein the cathode support member is cylindrical. 6. The moveable evaporation source system according to claim 1 , further comprising an insulator configured to be disposed between the cathode support member and the cathode. 7. The moveable evaporation source system according to claim 6 , wherein the insulator comprises a cup insulator. 8. The moveable evaporation source system according to claim 6 , wherein the insulator comprises a platter insulator. 9. The moveable evaporation source system according to claim 6 , wherein the insulator comprises a mounting insert comprising threads and the upper portion comprises a threaded portion whereby the upper portion is configured to mechanically interface with the insulator. 10. The moveable evaporation source system according to claim 6 , wherein the upper portion mechanically interfaces with the insulator. 11. The moveable evaporation source system according to claim 6 , wherein the upper portion of the cathode support member mechanically engages with the insulator. 12. The moveable evaporation source system according to claim 6 , wherein the insulator comprises a ceramic material. 13. The moveable evaporation source system according to claim 6 , wherein the insulator comprises a glass material.

Assignees

Inventors

Classifications

  • C23C14/325Primary

    Electric arc evaporation · CPC title

  • Oblique incidence of vaporised material on substrate · CPC title

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Frequently asked questions

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What does patent US9970098B2 cover?
A moveable evaporation source system may have an insulator disposed above a cathode support member, and a cathode support member disposed beneath the insulator and exerting an upward force on the insulator so that the upward force exerted by the cathode support member urges the insulator toward a down force source. A cathode may be placed between the insulator and the down force source and tran…
Who is the assignee on this patent?
United Technologies Corp
What technology area does this patent fall under?
Primary CPC classification C23C14/325. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 15 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).