Composition for forming films, film produced from said composition, and method for producing organic semiconductor element using said composition

Patent metadata

Field	Value
Publication number	US-9966575-B2
Application number	US-201414905451-A
Country	US
Kind code	B2
Filing date	Jul 14, 2014
Priority date	Jul 19, 2013
Publication date	May 8, 2018
Grant date	May 8, 2018

Abstract

A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the formula (1) and a repeating unit of the general formula (2); and a fluorine-containing solvent.

In the general formula (2), R 1 represents a C 1 -C 15 straight, C 3 -C 15 branched or C 3 -C 15 cyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom or chlorine atom and which may have a hydroxy group. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element as the composition can form a fluororesin film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.

First claim

The invention claimed is:

1. A film-forming composition for forming a fluororesin film on an organic semiconductor film, comprising:
a fluororesin having a repeating unit of the formula (1) and a repeating unit of the general formula (2)

where R 1 represents a C 1 -C 15 straight, C 3 -C 15 branched or C 3 -C 15 cyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom or chlorine atom and which may have a hydroxy group; and
a fluorine-containing solvent,
wherein the repeating unit of the formula (1) is contained in an amount of 33 to 90 mass % based on the total mass of the fluororesin;
wherein the fluorine-containing solvent includes either a fluorine-containing hydrocarbon or a fluorine-containing ether;
wherein the fluorine-containing hydrocarbon is a C 4 -C 8 straight, branched or cyclic hydrocarbon in which at least one hydrogen atom is replaced by a fluorine atom;
wherein the fluorine-containing ether is a fluorine-containing ether of the general formula (3)
R 2 —O—R 3   (3)

where R 2 represents a C 1 -C 15 straight, C 3 -C 15 branched or C 3 -C 15 cyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom; and R 3 represents a C 1 -C 15 straight, C 3 -C 15 branched or C 3 -C 15 cyclic hydrocarbon group in which at least one hydrogen atom is replaced by a fluorine atom; and
wherein the fluorine-containing solvent further includes a fluorine-containing alcohol of the general formula (4)
R 4 —OH  (4)

where R 4 represents a C 1 -C 15 straight, C 3 -C 15 branched or C 3 -C 15 cyclic hydrocarbon group in which at least one hydrogen atom is replaced by a fluorine atom.

2. The film-forming composition according to claim 1 , wherein the fluororesin has a fluorine content of 30 to 65 mass %.

3. The film-forming composition according to claim 1 , wherein the fluorine-containing solvent has a fluorine content of 50 to 70 mass %.

4. The film-forming composition according to claim 1 , wherein the repeating unit of the formula (1) is contained in an amount of 50 to 80 mass % based on the total mass of the fluororesin.

5. A fluororesin film formed by applying the film-forming composition according to claim 1 onto an organic semiconductor film.

Assignees

• Central Glass Co Ltd

Inventors

• Komoriya Haruhiko
• Terui Yoshiharu
• Kobayashi Fumito
• Hara Yukari
• Hara Ikunari

Classifications

• H01L27/3241

  Electricity · mapped topic

• G03F7/038

  Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

• C08F232/04

  having one carbon-to-carbon double bond · CPC title

• C08K5/06

  Ethers; Acetals; Ketals; Ortho-esters · CPC title

• C08K5/02

  Halogenated hydrocarbons {(C08K5/0091 takes precedence)} · CPC title