Methods for modifying pressure differential in a chemical vapor process

US9963779B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9963779-B2
Application numberUS-201615056358-A
CountryUS
Kind codeB2
Filing dateFeb 29, 2016
Priority dateFeb 29, 2016
Publication dateMay 8, 2018
Grant dateMay 8, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A process for densifying an annular porous structure comprising flowing a reactant gas into an inner diameter (ID) volume and through an ID surface of the annular porous structure, flowing the reactant gas through an outer diameter (OD) surface of the annular porous structure and into an OD volume, flowing the reactant gas from the OD volume through the OD surface of the annular porous structure, and flowing the reactant gas through an ID surface of the annular porous structure and into the ID volume.

First claim

Opening claim text (preview).

What is claimed is: 1. A process for densifying an annular porous structure comprising: flowing a reactant gas into an inner diameter (ID) volume and through an ID surface of the annular porous structure; flowing the reactant gas through an outer diameter (OD) surface of the annular porous structure and into an OD volume; flowing the reactant gas from the OD volume through the OD surface of the annular porous structure; and flowing the reactant gas through the ID surface of the annular porous structure and into the ID volume, wherein a pressure differential between the OD volume and the ID volume is modified during a single chemical vapor infiltration and deposition processing cycle; and further comprising: energizing a reversing valve by placing the reversing valve in a first state, the first state being a two port state; de-energizing the reversing valve by placing the reversing valve in a second state, the second state being a one-port state. 2. The process of claim 1 , further comprising flowing the reactant gas into a preheater, wherein the preheater heats the reactant gas to a defined temperature before flowing into the ID volume. 3. The process of claim 1 , wherein the ID volume is defined by the annular porous structure and a graphite susceptor. 4. The process of claim 3 , wherein the graphite susceptor is disposed within a furnace. 5. The process of claim 1 , wherein the reactant gas comprises at least one of methane, ethane, propane, cyclopentane, hydrogen, nitrogen, helium, argon, or an alkane. 6. The process of claim 1 , wherein the annular porous structure comprises a carbon fiber. 7. The process of claim 1 , wherein the flowing the reactant gas into the inner diameter (ID) volume cause an increase in pressure of the ID volume. 8. The process of claim 7 , wherein the increase in pressure of the ID volume creates the pressure differential between the ID volume and the OD volume. 9. The process of claim 8 , wherein the pressure differential drives the reactant gas to infiltrate a pore of the annular porous structure. 10. The process of claim 1 , further comprising positioning a plug to be at least one of inserted, removed, or maintained disposed in a lid of a graphite susceptor, the graphite susceptor supporting the annular porous structure. 11. The process of claim 1 , wherein the de-energizing the reversing valve occurs in response to a command from a processor.

Assignees

Inventors

Classifications

  • Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title

  • Pulsed gas flow or change of composition over time · CPC title

  • Density · CPC title

  • Carbon fibres in a carbon matrix · CPC title

  • C23C16/045Primary

    Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates · CPC title

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What does patent US9963779B2 cover?
A process for densifying an annular porous structure comprising flowing a reactant gas into an inner diameter (ID) volume and through an ID surface of the annular porous structure, flowing the reactant gas through an outer diameter (OD) surface of the annular porous structure and into an OD volume, flowing the reactant gas from the OD volume through the OD surface of the annular porous structur…
Who is the assignee on this patent?
Goodrich Corp
What technology area does this patent fall under?
Primary CPC classification C23C16/045. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 08 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).