Precipitation hardening of tantalum coated metals

US9963757B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9963757-B2
Application numberUS-201415026261-A
CountryUS
Kind codeB2
Filing dateNov 19, 2014
Priority dateDec 2, 2013
Publication dateMay 8, 2018
Grant dateMay 8, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A process includes: (a) providing a tantalum-coated metal alloy substrate; (b) heat annealing the tantalum-coated metal alloy substrate by heating to an annealing temperature for the tantalum-coated metal alloy substrate, holding at the annealing temperature for a period of time and then quenching to a temperature below 50 degrees Celsius; (c) heating the tantalum-coated metal substrate to the precipitation hardening temperature of the metal alloy substrate; and (d) cooling the tantalum-coated metal alloy substrate to a temperature below 50 degrees Celsius; wherein the process is further characterized by carrying out steps (b)-(d) under a tantalum-inert gas atmosphere and by quenching in step (b) and cooling in step (d) being carried out by flowing a tantalum-inert gas having a temperature of less than 50 degrees Celsius over the tantalum-coated metal alloy substrate.

First claim

Opening claim text (preview).

The invention claimed is: 1. A process comprising: (a) providing a tantalum-coated metal alloy substrate prepared by providing a precipitation hardened metal alloy substrate and applying tantalum to the substrate while sustaining a temperature greater than 700 degrees Celsius, characterized by resulting in a homogeneous tantalum coating over the metal alloy substrate; (b) heat annealing the tantalum-coated metal alloy substrate by heating to an annealing temperature for the tantalum-coated metal alloy substrate, holding at the annealing temperature for a period of time and then quenching to a temperature below 50 degrees Celsius; (c) heating the tantalum-coated metal substrate to the precipitation hardening temperature of the metal alloy substrate; and (d) cooling the tantalum-coated metal alloy substrate to a temperature below 50 degrees Celsius; wherein the process is further characterized by carrying out steps (b)-(d) under a tantalum-inert gas atmosphere and by quenching in step (b) and cooling in step (d) being carried out by flowing a tantalum-inert gas having a temperature of less than 50 degrees Celsius over the tantalum-coated metal alloy substrate. 2. The process of claim 1 , further characterized by the tantalum-inert gas comprising a noble gas. 3. The process of claim 1 , further characterize by the tantalum-inert gas comprising at least 99.999 mole-percent argon based on total tantalum-inert gas composition. 4. The process of claim 1 , further characterized by the metal alloy substrate that is tantalum-coated being a stainless steel. 5. The process of claim 1 , further characterized by step (d) causing the tantalum-coated metal alloy substrate to cool from the precipitation hardening temperature to a temperature below 50 degrees Celsius at a rate of 100 degrees Celsius per hour or faster and 200° C. per hour or slower.

Assignees

Inventors

Classifications

  • Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material · CPC title

  • High-melting or refractory metals or alloys based thereon · CPC title

  • Gases; Liquefied or solidified normally gaseous material · CPC title

  • Methods of annealing · CPC title

  • Hardening by cooling below 0 degrees Celsius · CPC title

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Frequently asked questions

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What does patent US9963757B2 cover?
A process includes: (a) providing a tantalum-coated metal alloy substrate; (b) heat annealing the tantalum-coated metal alloy substrate by heating to an annealing temperature for the tantalum-coated metal alloy substrate, holding at the annealing temperature for a period of time and then quenching to a temperature below 50 degrees Celsius; (c) heating the tantalum-coated metal substrate to the …
Who is the assignee on this patent?
Dow Global Technologies Llc
What technology area does this patent fall under?
Primary CPC classification C21D9/0068. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 08 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).