Low warp fan-out processing method and production of substrates therefor
US-11875993-B2 · Jan 16, 2024 · US
US9963381B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9963381-B2 |
| Application number | US-201514808965-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 24, 2015 |
| Priority date | Jul 24, 2015 |
| Publication date | May 8, 2018 |
| Grant date | May 8, 2018 |
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Embodiments of the present invention provide a method for finishing a glass product including a glass layer, the glass layer comprising boron. The method includes the step of cleaning the glass layer in order to remove boron at least at the surface of the glass layer. The step of cleaning includes the substep of esterification using a medium comprising an alcohol.
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What is claimed is: 1. A method for finishing a glass product comprising a glass layer, the glass layer comprising boron, the method comprising: cleaning the glass layer in order to remove boron at a surface of the glass layer, wherein the step of cleaning comprises a substep of esterification using a medium comprising an alcohol, wherein the method comprises a process step of structuring the glass layer comprising a substep of lithography before performing the step of cleaning. 2. A method according to claim 1 , wherein the substep of esterification is performed as a chemical reaction of the alcohol and the boron. 3. A method according to claim 1 , wherein the glass product comprises a product selected from the group consisting of MEMS devices, LABS devices, electronic devices, electronic devices having a borophosphorsilicate layer as glass layer, and medical devices. 4. The method according to claim 1 , wherein the medium further comprises an acid. 5. The method according to claim 4 , wherein the acid has a purpose to perform a stabilization of the medium and/or a catalyzation of a chemical reaction of the substep of esterification. 6. The method according to claim 4 , wherein the acid has a percentage of 1% of the medium or a percentage within a range of 0.1% to 10% of the medium. 7. The method according to claim 1 , wherein the alcohol comprises an alcohol selected from the group consisting of ethanol, isopropanol and MeOH and combinations thereof. 8. The method according to claim 1 , wherein the alcohol comprises methanol. 9. The method according to claim 1 , wherein the cleaning is performed such that a boric concentration of the glass layer is reduced at least up to 75% at least at a depth of 100 nm. 10. The method according to claim 1 , wherein a process time of the cleaning lies within a range between 15 s and 300 s. 11. The method according to claim 1 , wherein the substep of esterification is performed at a temperature lying within a temperature range between 5° C. and 50° C. 12. The method according to claim 1 , wherein the cleaning is performed such that a boric concentration at a near surface of the glass layer is reduced by at least 75% up to a depth of 100 nm when compared to the boric concentration at a core of the glass layer. 13. The method according to claim 1 , wherein the step of cleaning comprises a process substep of glass etching before performing the substep of esterification. 14. The method according to claim 1 , wherein the step of cleaning comprises a process substep of drying using isopropanol after performing the substep of esterification. 15. The method according to claim 1 , wherein the step of cleaning includes a process step of hard mask stripping after the substep of esterification. 16. The method according to claim 1 , wherein the structuring comprises depositing of a hardmask, resist baking, plasma hardmask etching and/or wet-chemical glass washing. 17. The method according to claim 1 , wherein the method comprises a process step of initial etching before performing the step of structuring. 18. A method for manufacturing a glass substrate that comprises boron, the method comprising: structuring the glass substrate including performing a lithography step; and cleaning the glass substrate in order to remove boron at a near surface of the glass substrate up to a depth of 100 nm of the glass substrate, wherein the cleaning comprises esterification using a medium comprising more than 80% of MeOH and less than 5% of H 2 SO 4 . 19. A method for finishing a glass product comprising a glass layer, the glass layer comprising boron, the method comprising: cleaning the glass layer in order to remove boron at a surface of the glass layer, wherein the step of cleaning comprises a substep of esterification using a medium comprising an alcohol, wherein the step of cleaning includes a process step of hard mask stripping after the substep of esterification.
Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface · CPC title
Cleaning of glass (specially adapted to plate glass B08B11/00) · CPC title
by diffusing ions or metals into the surface · CPC title
Cleaning, e.g. for reuse (C03C25/62 -C03C25/66 take precedence) · CPC title
Surface treatment of glass, not in the form of fibres or filaments, by etching (etching or surface-brightening compositions, in general C09K13/00) · CPC title
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