Method for making nanotube film

Patent metadata

Field	Value
Publication number	US-9963347-B2
Application number	US-201514666509-A
Country	US
Kind code	B2
Filing date	Mar 24, 2015
Priority date	Mar 26, 2014
Publication date	May 8, 2018
Grant date	May 8, 2018

Abstract

The disclosure relates to a method of making nanotube film. The method includes following steps. A free-standing carbon nanotube film is provided. The carbon nanotube film includes a number of carbon nanotubes aligned and connected with each other via van der Waals force. The carbon nanotube film is suspended and defects are induced on the surface of the carbon nanotubes. A nano-material layer is grown on the surface of the carbon nanotubes via atomic layer deposition. The carbon nanotube film is removed by annealing to form a number of nanotubes; wherein the number of nanotubes are successively aligned and connected with each other to form a free-standing nanotube film.

First claim

What is claimed is:

1. A method for making a nanotube film, the method comprising:
providing a free standing carbon nanotube film, wherein the free standing carbon nanotube film comprises a plurality of carbon nanotubes orderly arranged and combined with each other via van der Waals force to form a plurality of apertures;
inducing defects on surfaces of the plurality of carbon nanotubes to form a treated carbon nanotube film, wherein the inducing defects on surfaces of the plurality of carbon nanotubes comprises suspending and oxygen plasma treating the free standing carbon nanotube film;
growing a nano-material layer on the surfaces of the plurality of carbon nanotubes, by atomic layer deposition, to form a nanotube film preform, wherein a thickness of the nano-material layer is in a range from about 10 nanometers to about 30 nanometers, and a smoothness of the nano-material layer is at least less than 10 nanometers; and
removing the free standing carbon nanotube film by annealing the nanotube film preform, wherein a free-standing nanotube film is obtained after the removing the free standing carbon nanotube film, and the free-standing nanotube film comprises a plurality of nanotubes orderly arranged and combined with each other.

2. The method of claim 1 , wherein the plurality of carbon nanotubes are joined end-to-end along a length direction of the plurality of carbon nanotubes by van der Waals force therebetween, and the plurality of apertures extend along the length direction.

3. The method of claim 1 , wherein the providing the free standing carbon nanotube film comprises stacking two carbon nanotube films.

4. The method of claim 1 , wherein growing the nano-material layer comprises forming a continuous nano-material layer to enclose the plurality of carbon nanotubes therein.

5. The method of claim 1 , wherein a material of the nano-material layer is selected from the group consisting of metal oxide, metal nitride, metal carbide, silicon oxide, silicon nitride, and silicon carbide.

6. The method of claim 1 , wherein growing the nano-material layer on the surfaces of the plurality of carbon nanotubes by atomic layer deposition comprises following substeps:
suspending a portion of the treated carbon nanotube film in a vacuum chamber of a atomic layer deposition device; and
alternately introducing metal organic compound and water in to the vacuum chamber of the atomic layer deposition device to grow a metal oxide nano-material.

7. The method of claim 6 , wherein the metal organic compound is trimethylaluminum, the metal oxide nano-material is alumina.

8. The method of claim 1 , wherein the annealing the nanotube film preform comprises heating the nanotube film preform in an oxygen atmosphere at a temperature in a range from about 500° C. to about 1000° C.

9. The method of claim 1 , wherein the annealing the nanotube film preform comprises suspending the nanotube film preform.

10. A method for making a nanotube film, the method comprising:
providing a free standing carbon nanotube film, wherein the free standing carbon nanotube film comprises a plurality of carbon nanotubes orderly arranged and combined with each other via van der Waals force to form a plurality of apertures;
inducing defects on surfaces of the plurality of carbon nanotubes to form a treated carbon nanotube film, wherein the inducing defects on surfaces of the plurality of carbon nanotubes comprises coating a plurality of carbon particles on the surfaces of the plurality of carbon nanotubes to form the defects by a carbon accumulation method;
growing a nano-material layer on the surfaces of the plurality of carbon nanotubes, by atomic layer deposition, to form a nanotube film preform, wherein a thickness of the nano-material layer is in a range from about 10 nanometers to about 30 nanometers; and
removing the free standing carbon nanotube film by annealing the nanotube film preform, wherein a free-standing nanotube film is obtained after the removing the free standing carbon nanotube film, and the free-standing nanotube film comprises a plurality of nanotubes orderly arranged and combined with each other.

11. The method of claim 10 , wherein the plurality of carbon nanotubes are joined end-to-end along a length direction of the plurality of carbon nanotubes by van der Waals force therebetween, and the plurality of apertures extend along the length direction.

12. The method of claim 10 , wherein the providing the free standing carbon nanotube film comprises stacking two carbon nanotube films.

13. The method of claim 10 , wherein the carbon accumulation method is selected from the group consisting of physical vapor deposition, chemical vapor deposition, and spraying.

14. The method of claim 10 , wherein growing the nano-material layer comprises forming a continuous nano-material layer to enclose the plurality of carbon nanotubes therein.

15. The method of claim 10 , wherein a material of the nano-material layer is selected from the group consisting of metal oxide, metal nitride, metal carbide, silicon oxide, silicon nitride, and silicon carbide.

16. The method of claim 10 , wherein growing the nano-material layer on the surfaces of the plurality of carbon nanotubes by atomic layer deposition comprises following substeps:
suspending a portion of the treated carbon nanotube film in a vacuum chamber of a atomic layer deposition device; and
alternately introducing metal organic compound and water in to the vacuum chamber of the atomic layer deposition device to grow a metal oxide nano-material.

17. The method of claim 16 , wherein the metal organic compound is trimethylaluminum, the metal oxide nano-material is alumina.

18. The method of claim 10 , wherein the annealing the nanotube film preform comprises heating the nanotube film preform in an oxygen atmosphere at a temperature in a range from about 500° C. to about 1000° C.

19. The method of claim 10 , wherein the annealing the nanotube film preform comprises suspending the nanotube film preform.

Assignees

• Univ Tsinghua
• Hon Hai Prec Ind Co Ltd

Inventors

• Ma He
• Wei Yang
• Jiang Kai-Li
• Fan Shou-Shan

Classifications

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• C01B32/168

  After-treatment · CPC title

• C01B32/174

  Derivatisation; Solubilisation; Dispersion in solvents · CPC title

• C01B32/16 Primary

  Preparation · CPC title

• C01B31/0226 Primary

  Chemistry & Metallurgy · mapped topic